Abstract: Apparatus for treating the surface of objects with plasma, having: an enclosure; a means for placing this enclosure under vacuum; a zone for storing objects to be treated, which is called the upstream storing zone; a zone for storing treated objects, which is called the downstream storing zone; at least two plasma treatment chambers having a means for injecting an active gas mixture, a means for creating an electrical discharge and a means for confining the plasma to the volume inside the chamber; and a means for transferring between the storing zones and the chambers, characterized in that the transferring means are conveying means defining a conveying direction, and in that the various chambers are placed one behind the other, in the conveying direction, and in that the atmospheres of the various plasma treatment chambers are not hermetically sealed off from one another.

Abstract: A facility having a main space under vacuum, at least one device for transferring objects between a zone at atmospheric pressure and a zone under vacuum, a device (30) for unstacking/stacking objects, a device for conveying objects and support elements (24, 25) for supporting each object, these being secured to the conveying device. Each transfer device has a frame and a transfer member, provided with at least one cell (C1-C4) that accepts at least one object that is to be transferred. The frame defines a first opening in communication with the zone at atmospheric pressure, a second opening in communication with the zone under vacuum, and an intermediate region intended to be placed either under vacuum or at atmospheric pressure.

Abstract: A method carried out in a facility having an enclosure, a support for the substrate, a counter-electrode, a head provided with an electrode, a device for diffusing an inert gas and device for injecting an active gas mixture towards the support. The method involves continuously introducing bath the inert gas and the active gas mixture towards the support, continuously activating the reactive gas in the electrical discharge and treating the surface of the moving substrate, continuously discharging, via the outlet, the gaseous atmosphere from the inner volume comprising a fraction of the inert gas and the active gas mixture, adjusting the effective cross-section of the outlet and/or adjusting the total flow rate of the inert gas and the active gas mixture, such that the inner volume of each head is at a slight overpressure relative to the inner volume of the enclosure.

Abstract: Apparatus for treating the surface of objects with plasma, having: an enclosure; a means for placing this enclosure under vacuum; a zone for storing objects to be treated, which is called the upstream storing zone; a zone for storing treated objects, which is called the downstream storing zone; at least two plasma treatment chambers having a means for injecting an active gas mixture, a means for creating an electrical discharge and a means for confining the plasma to the volume inside the chamber; and a means for transferring between the storing zones and the chambers, characterized in that the transferring means are conveying means defining a conveying direction, and in that the various chambers are placed one behind the other, in the conveying direction, and in that the atmospheres of the various plasma treatment chambers are not hermetically sealed off from one another.

Abstract: An installation having a housing, a substrate support (20) received in the housing, diffuser (42) for diffusing an inert gas towards the substrate support, and at least one head (30) defining an inner volume (V) opened opposite to the top, the head being provided with at least two electrodes (8, 8?, 8?) for creating an electric discharge and with an injector (7, 7?, 7?) for injecting a gaseous mixture towards the substrate. The injector has at least one injection tube (7, 7?, 7?) placed between two adjacent electrodes or between one electrode and a peripheral wall, the tube being provided with injection holes facing the substrate support, for injecting the gaseous mixture on the substrate, whereas diffuser is provided inside the head, the injection tube being placed between the substrate support and the diffuser so that, in use, the gaseous mixture is urged against the substrate by the inert gas.