Patents Assigned to Colromm, Inc.
  • Patent number: 4509451
    Abstract: Applicants have invented a new low temperature method (50.degree. C. to 500.degree. C.) to deposit and grow microelectronic thin films using cold cathode electron beams to initiate and sustain both gas phase and surface chemical reactions. The new method uses electron beams generated by glow discharge electron guns. Secondary electrons are emitted from these electron guns following ion and fast neutral bombardment upon cathode surfaces and secondary electrons so formed are accelerated in the cathode sheath.Our method uses the plasma generated electron beams to decompose reactant molecules directly by electron impact and indirectly by the vacuum ultraviolet radiation generated following rare gas electron collisions in the beam region. The reactant molecules can be in the gas phase or adsorbed on substrate surfaces. The electron beams are spatially confined and excite only a localized region above the substrate so that direct plasma bombardment of the substrate is avoided.
    Type: Grant
    Filed: March 29, 1983
    Date of Patent: April 9, 1985
    Assignee: Colromm, Inc.
    Inventors: George J. Collins, Lance R. Thompson, Jorge J. Rocca, Paul K. Boyer
  • Patent number: 4496449
    Abstract: A new apparatus for altering the microtopography of certain solid materials commonly used in the integrated circuit industry by electron beam induced etching is described. This is accomplished with one or more glow discharge electron beam guns operating in a controlled gas environment. Specially designed versions of these guns perform the dual functions of dissociating certain donors of reactive gases in close proximity to the substrate surface and enhancing surface reactions anisotropically with the directed electron beam energy. The geometrical relationship between the substrate and the electron beams is chosen to optimize the role of each beam for its particular function. The operating gas environment is typically a carefully controlled mixture of a non-reactive buffer gas and one or more reactive gases. The gas flow rates, partial pressures, and direction are controlled by valves, regulators, and nozzles connected to the low pressure vessel.
    Type: Grant
    Filed: December 16, 1983
    Date of Patent: January 29, 1985
    Assignee: Colromm, Inc.
    Inventors: Jorge J. Rocca, George J. Collins