Patents Assigned to Commissariat a l'Ernergie, Atomique
  • Method for forming under a thin layer of a first material portions of another material and/ or empty areas
    Publication number: 20070155159
    Abstract: A method for forming a empty area under a layer of a given material, including forming on a substrate a stacking of a photosensitive layer and of a layer of the given material; insolating a portion of the photosensitive layer or its complement according to whether the photosensitive layer is positive or negative with an electron beam crossing the layer of the given material; and removing the portion of the photosensitive layer.
    Type: Application
    Filed: February 28, 2007
    Publication date: July 5, 2007
    Applicants: STMicroelectronics S.A., Commissariat A L'Ernergie Atomique
    Inventors: Philippe Coronel, Yves Laplanche, Laurent Pain
  • Method for forming, under a thin layer of a first material, portions of another material and/or empty areas
    Patent number: 7202153
    Abstract: A method for forming a empty area under a layer of a given material, including forming on a substrate a stacking of a photosensitive layer and of a layer of the given material; insolating a portion of the photosensitive layer or its complement according to whether the photosensitive layer is positive or negative with an electron beam crossing the layer of the given material; and removing the portion of the photosensitive layer.
    Type: Grant
    Filed: August 9, 2004
    Date of Patent: April 10, 2007
    Assignees: STMicroelectronics S.A., Commissariat a l'Ernergie, Atomique
    Inventors: Philippe Coronel, Yves Laplanche, Laurent Pain
  • Method for forming, under a thin layer of a first material, portions of another material and/or empty areas
    Publication number: 20050037603
    Abstract: A method for forming a empty area under a layer of a given material, including forming on a substrate a stacking of a photosensitive layer and of a layer of the given material; insolating a portion of the photosensitive layer or its complement according to whether the photosensitive layer is positive or negative with an electron beam crossing the layer of the given material; and removing the portion of the photosensitive layer.
    Type: Application
    Filed: August 9, 2004
    Publication date: February 17, 2005
    Applicants: STMicroelectronics S.A., Commissariat A L'Ernergie Atomique
    Inventors: Philippe Coronel, Yves Laplanche, Laurent Pain