Abstract: Top surface imaging by silylation of organic photoresists for use in lithographic techniques for the manufacture of microelectronic devices is improved by the use of certain mixtures of organosilane silylating agents. The mixture includes a monofunctional silane in combination with a di- or polyfunctional silane, selected such that the boiling points are the same or very close to each other to facilitate a vapor-phase reaction. Silylation with this mixture provides effective penetration of the silane into the resist without causing so much lowering of the glass transition temperature of the resist that the resist flows under the processing steps and distorts the pattern.

Abstract: A method for providing an inorganic substrate having improved adherence for polymeric films is disclosed. The method entails reacting at least one organosilane compound having at least one alkylsilyl moiety therein and at least one hydrolyzable group capable of reacting with the substrate to silylate the substrate. Hydrolyzable by-products from the reaction, if any, have a pH less than or equal to about 7.