Abstract: A flow control device to control the rate of flow of granular material or the like therethrough has a valved inlet to control the ingress of material into the flow control device. A flowmeter is downstream of the valved inlet to receive the material and detect the rate of flow thereof. The material travels along a generally steep path between the valved inlet and the flowmeter. The flowmeter includes a guide to collect the material into a generally coherent stream and redirect the stream from the generally steep path to a generally horizontal path. A controller is responsive to the flowmeter and controls the valved inlet so that the rate of flow of material through the flow control device is at or near to a desired rate.
Type:
Grant
Filed:
April 30, 1996
Date of Patent:
May 19, 1998
Assignee:
Comptrol Computer Control, Inc.
Inventors:
Leonard A. Vienneau, Anthony K. Vienneau, Gary R. Baksi