Abstract: Disclosed are barrier coatings for fused silica components used in semiconductor processing. In particular, the present disclosure concerns protective substrate-barrier coatings composed of corrosion-resilient metal compounds which provide superior resistance to erosion/corrosion when a coated substrate is subjected to the acidic environments at elevated temperatures typical for semiconductor processing.
Type:
Grant
Filed:
December 22, 2017
Date of Patent:
June 13, 2023
Assignees:
CONAX TECHNOLOGIES, Alfred University
Inventors:
Matthew M. Hall, Timothy Keenan, Lana Margaret Placek, Scott Michael Kroon, William Sean Halligan, Michael Edward Ferraro