Patents Assigned to Conrnell University
  • Publication number: 20140205818
    Abstract: A method for forming patterns of organic polymer materials. The method can be used to form a layer with two patterned organic polymer materials. The photoresist and solvents used in the photoresist deposition and removal steps do not substantially affect the organic polymer materials.
    Type: Application
    Filed: March 19, 2012
    Publication date: July 24, 2014
    Applicant: Conrnell University
    Inventors: Evan L. Schwartz, Wei Min Chan, Jin-Kyun Lee, Sandip Tiwari, Christopher K. Ober