Abstract: A method for forming patterns of organic polymer materials. The method can be used to form a layer with two patterned organic polymer materials. The photoresist and solvents used in the photoresist deposition and removal steps do not substantially affect the organic polymer materials.
Type:
Application
Filed:
March 19, 2012
Publication date:
July 24, 2014
Applicant:
Conrnell University
Inventors:
Evan L. Schwartz, Wei Min Chan, Jin-Kyun Lee, Sandip Tiwari, Christopher K. Ober