Abstract: The present invention is a method for forming a vertically oriented element having a narrower area near its center away from either end. The present invention will find applicability in other memory cell structures. The element will have a narrow portion towards its center such that current density will be higher away from the ends of the element. In this way, the heating will occur away from the ends of the storage element. Heating in a phase-change or resistive change element leads to end of life conditions, including the condition whereby contaminants from the end point contacts are enabled to migrate away from the end point and into the storage element thereby contaminating the storage element material and reducing its ability to be programmed, erased and/or read back.

Abstract: The present invention is a method of incorporating a non-volatile memory into a CMOS process that requires four or fewer masks and limited additional processing steps. The present invention is an epi-silicon or poly-silicon process sequence that is introduced into a standard CMOS process (i) after the MOS transistors' gate oxide is formed and the gate poly-silicon is deposited (thereby protecting the delicate surface areas of the MOS transistors) and (ii) before the salicided contacts to those MOS transistors are formed (thereby performing any newly introduced steps having an elevated temperature, such as any epi-silicon or poly-silicon deposition for the formation of diodes, prior to the formation of that salicide). A 4F2 memory array is achieved with a diode matrix wherein the diodes are formed in the vertical orientation.

Abstract: Integrated electronic memory devices include control logic and one or more cross point information storage arrays. The cross point storage array(s) include a non-linear conductor proximate to at least one cross point storage location, and the control logic comprises (i) an NMOS type transistor and a PNP type transistor, but not a PMOS type transistor, or (ii) a PMOS type transistor and an NPN type transistor, but not an NMOS type transistor.

Abstract: In various embodiments, a method for forming a memory array includes forming a plurality of rows and columns of hardmask material, etching holes in the one or more layers of insulating material using the combined masking properties of the rows of hardmask material and the columns of hardmask material, and forming memory cells in the holes. The corners of the holes can be rounded.

Abstract: The present invention is a method for forming a self-aligned, three dimensional structure in a crystalline surface and then converting that self-aligned, three dimensional structure into an array of diodes or current switches so as to minimize reverse leakage in the resulting array.

Abstract: The present invention is a means and method for constructing and operating a 3-D array and, more particularly, a 3-D memory array. This array can be manufactured as a monolithic integrated circuit at low cost by virtue of the limited number of steps per layer of memory elements. The low number of steps results by having the storage elements separated by a resistive component as opposed to an active component. The 3-D array is in essence, an array of 2-D resistive arrays (row-planes) having a long dimension (typically along the rows) and a short dimension (typically in the direction of the stacked layers). Any one row-plane can be isolated from the rest and be accessed independently from all of the other row-planes in the 3-D array. This makes it possible to operate and analyze a single row-plane as a mostly stand-alone circuit. The present invention lends itself to single bit accesses as well as simultaneous multiple bit accesses.

Abstract: The present invention is a method of incorporating a non-volatile memory into a CMOS process that requires four or fewer masks and limited additional processing steps. The present invention is an epi-silicon or poly-silicon process sequence that is introduced into a standard CMOS process (i) after the MOS transistors' gate oxide is formed and the gate poly-silicon is deposited (thereby protecting the delicate surface areas of the MOS transistors) and (ii) before the salicided contacts to those MOS transistors are formed (thereby performing any newly introduced steps having an elevated temperature, such as any epi-silicon or poly-silicon deposition for the formation of diodes, prior to the formation of that salicide). A 4F2 memory array is achieved with a diode matrix wherein the diodes are formed in the vertical orientation.

Abstract: Methods of forming memory devices include providing a substrate, forming source, channel, and drain layers over the substrate, and patterning the source, channel, and drain layers into an array of memory switches each having a cross-sectional area less than 6 F2. The channel layer has a doping type different from a doping type of the source layer, and the drain layer has a doping type different from a doping type of the channel layer.

Abstract: A vertically oriented memory element having a narrower area near its center away from its ends is formed. Current density and heating are higher away from the ends of the memory element, thus increasing its lifetime.

Abstract: The present invention is a method of incorporating a non-volatile memory into a CMOS process that requires four or fewer masks and limited additional processing steps. The present invention is an epi-silicon or poly-silicon process sequence that is introduced into a standard CMOS process (i) after the MOS transistors' gate oxide is formed and the gate poly-silicon is deposited (thereby protecting the delicate surface areas of the MOS transistors) and (ii) before the salicided contacts to those MOS transistors are formed (thereby performing any newly introduced steps having an elevated temperature, such as any epi-silicon or poly-silicon deposition for the formation of diodes, prior to the formation of that salicide). A 4F2 memory array is achieved with a diode matrix wherein the diodes are formed in the vertical orientation.

Abstract: An electronic circuit such as a latch or a sequencer includes a plurality of transistors, all of the transistors being either NMOS transistors or PMOS transistors, and dissipates less than or approximately the same amount of power as an equivalent CMOS circuit.

Abstract: A method for fabricating a memory device includes depositing a phase-change and/or a resistive change material. The memory device is formed photolithographically using sixteen or fewer masks.

Abstract: The present invention relates to electronic driver circuits, and more particularly, to low power electronic driver circuits having low manufacturing costs. The present invention is a circuit design that utilizes two transistor types that can be manufactured together thereby reducing the number of processing steps and masks and resulting in lower cost.

Abstract: An array of vertically constructed, electronic switches is disclosed having three, four or more contacts and having a common bottom contact and a plurality of common middle contacts. This switch array will find use in memory devices or display devices.

Abstract: In one aspect, an electronic memory array includes overlapping, generally parallel sets of conductors, and includes storage elements near each point of overlap. One set of conductors has a non-negligible resistance. An address path for each storage element traverses a portion of one each of the first and second sets of conductors and a selectable resistance element. All storage element address paths have substantially equivalent voltage drops across the corresponding storage elements.

Abstract: A high density memory device is fabricated three dimensionally in layers. To keep points of failure low, address decoding circuits are included within each layer so that, in addition to power and data lines, only the address signal lines need be interconnected between the layers.

Abstract: An electronic circuit such as a latch or a sequencer includes a plurality of transistors, all of the transistors being either NMOS transistors or PMOS transistors, and dissipates less than or approximately the same amount of power as an equivalent CMOS circuit.

Abstract: A memory device having a plurality of storage locations disposed along a plurality of generally parallel lines includes, connected to the lines, a decoder circuit for selecting one line, and, connected to each line, a line-disabling circuit for selectively preventing the line from being energized during line selection.

Abstract: A memory-array decoder operably coupled to a memory array comprising a sequence of rows and receiving as input a plurality of address bits includes first and second decoder stages. The first decoder stage selects one or more first rows by decoding a first subset of the address bits, and the second decoder stage selects one or more second rows based on locations, within the sequence, of one or more third rows different from the one or more second rows.

Abstract: Solid-state memory devices featuring pluralities of lines of data storage elements are configured for read and/or write access by alternately or simultaneously accessing different lines.