Patents Assigned to Core Plasma Technology Inc.
  • Publication number: 20160346729
    Abstract: A facility for purifying harmful gas disposing harmful gas discharged from at least one process chamber in which processes are performed in the vacuum status by a vacuum pump, the facility including: one or a plurality of microwave generators generating microwave; a plurality of wave guides including a wave path through which the microwave generated by the microwave generator is provided; a plasma discharge chamber including the wave guides connected by a certain distance along the harmful gas flow direction outside; and a shield installed inside the plasma discharge chamber preventing ions or electrons for the plasma discharge from leaking outside by contacting with the plasma discharge chamber.
    Type: Application
    Filed: March 28, 2016
    Publication date: December 1, 2016
    Applicant: Core Plasma Technology Inc.
    Inventors: Won Ju YI, David Young Eun Yi, Daniel Young Hyun Yi
  • Publication number: 20160220942
    Abstract: A facility for purifying harmful gas according to an exemplary embodiment of the inventive concept includes a vacuum pump for discharging harmful gas generated from the process chamber, preprocessing apparatus a preprocessing apparatus with which buffer gas for plasma discharge is provided together with the harmful gas discharged from the process chamber and performing preprocess such that noxious substances in the harmful gas and the buffer gas may be activated by emitting microwave, and a plasma reactor receiving the harmful gas including activated noxious substances and the activated buffer gas from the preprocessing apparatus and decomposing the activated substances by generating plasma discharge.
    Type: Application
    Filed: January 13, 2016
    Publication date: August 4, 2016
    Applicant: Core Plasma Technology Inc.
    Inventor: Won Ju YI