Abstract: A single mask, low temperature reactive ion etching process for fabricating high aspect ratio, released single crystal microelectromechanical structures independently of crystal orientation.
Type:
Grant
Filed:
September 22, 1994
Date of Patent:
December 8, 1998
Assignee:
Cornell Research Foundcatton, Inc.
Inventors:
Kevin A. Shaw, Z. Lisa Zhang, Noel C. MacDonald