Patents Assigned to Corning Incorported
  • Patent number: 11389769
    Abstract: Disclosed herein are filtration articles comprising a porous ceramic structure comprising a plurality of channels separated by a plurality of porous interior walls, and a nanomembrane disposed on at least a portion of a surface of the porous ceramic structure, wherein the nanomembrane comprises nanoparticles of at least one inorganic oxide, and wherein the nanoparticles are present in a concentration ranging from about 0.001 g/L to about 1 g/L based on the total volume of the porous ceramic structure. Methods for making such filtration articles and methods for filtering a particulate from a fluid using such filtration articles are also disclosed herein.
    Type: Grant
    Filed: October 28, 2016
    Date of Patent: July 19, 2022
    Assignee: Corning Incorported
    Inventors: Guohua Chen, Curtis Robert Fekety, Jianguo Wang, Huiqing Wu
  • Patent number: 8409874
    Abstract: The present invention relates to a method to treat a product which product comprises a surface which surface includes a plasma polymer of an organic monomer wherein immobilized on said plasma polymerized surface is at least one biological entity comprising, contacting said product with an agent that promotes, either directly or indirectly, the disassociation of said entity from said product.
    Type: Grant
    Filed: April 7, 2005
    Date of Patent: April 2, 2013
    Assignee: Corning Incorported
    Inventors: Rob Short, Anthony J. Day
  • Patent number: 6821903
    Abstract: In order to manufacture an integrated optical circuit, a first mask is formed on a first region of a substrate and defines the shape of at least one optical device (such as a waveguide). A second mask is formed on a second region of the substrate and corresponds to an optical structure (such as a periodic array structure or photonic crystal) to be formed in a second region of the substrate distinct from the first region. The first mask and the second mask are each made of a material which substantially resists a predetermined etching gas. The second mask may formed, patterned, and etched without adversely affecting the characteristics of the first mask.
    Type: Grant
    Filed: December 5, 2000
    Date of Patent: November 23, 2004
    Assignee: Corning Incorported
    Inventors: Jean-Charles J. C. Cotteverte, Fernando Dias-Costa, Christophe F. P. Renvaze, Dusan Nedeljkovic