Abstract: An evaporator cell (100), which is adapted for evaporating, in particular, a high-melting evaporant, includes a crucible (10) for receiving the evaporant, said crucible including a crucible bottom (11), a side wall (12) which extends in an axial direction of the crucible (10), and a crucible opening (13), and a heating device (20) with a heating resistor (21), which has a plurality of heating zones (21.1, 21.2), which are arranged on an outside surface of the crucible (10) and extend axially along the crucible (10), wherein the heating zones (21.1, 21.2) are equipped for multilateral resistance heating and/or electron beam heating of the crucible (10), and wherein the heating zones (21.1, 21.2) are constructed in such a manner that a heating current through the heating resistor (21), which is formed for example by a resistance sleeve, flows in parallel and in the same sense through all heating zones (21.1, 21.2). A method of operating the evaporator cell is also described.
Type:
Application
Filed:
July 21, 2008
Publication date:
July 29, 2010
Applicants:
CREATEC FISCHER & CO. GMBH, FORSCHUNGSVERBUND BERLIN E.V.
Inventors:
Wolfgang Braun, Albrecht Fischer, Tatsuro Watahiki
Abstract: An evaporator cell for evaporating a high-melting material to be evaporated, comprises a crucible for receiving the material to be evaporated, and a heating device with a heating resistor for the resistance heating of the crucible, the heating resistor being provided as an electron emitter for the electron beam heating of the crucible.
Type:
Application
Filed:
March 3, 2010
Publication date:
June 24, 2010
Applicants:
CREATEC FISCHER & CO. GMBH, FORSCHUNGSVERBUND BERLIN E.V.
Abstract: A process for the evaporation of a high-melting material in an evaporator cell having a crucible for receiving the material to be evaporated, and a heating device with a heating resistor for the resistance heating of the crucible, the heating resistor being provided as an electron emitter for the electron beam heating of the crucible.
Type:
Grant
Filed:
May 31, 2006
Date of Patent:
April 20, 2010
Assignees:
CreaTec Fischer & Co. GmbH, Forschungsverbund Berlin e.V.
Abstract: A molecular beam epitaxy (MBE) device (100) which is designed for the reactive deposition of a group III nitride compound semiconductor comprises a vacuum chamber (10) which comprises at least one molecular beam source (11) and at least one injector (12) designed to inject ammonia into the vacuum chamber (10), a first cold trap device (20) comprising at least one cold trap (21, 22) designed to condense excess ammonia, a pump device (30) comprising at least one pump (31, 33, 35) designed to evacuate the vacuum chamber (10), and a barrier device (40), by means of which the first cold trap device (20) can be separated from the vacuum chamber (10). A method for operating an MBE device is also described.
Type:
Application
Filed:
November 13, 2008
Publication date:
May 28, 2009
Applicants:
FORSCHUNGSVERBUND BERLIN E.V., CREATEC FISCHER & CO. GMBH
Abstract: An evaporator cell, in particular for evaporating a high-melting material to be evaporated, comprises a crucible for receiving the material to be evaporated, and a heating device with a heating resistor for the resistance heating of the crucible, the heating resistor being provided as an electron emitter for the electron beam heating of the crucible. A process for the evaporation of a high-melting material to be evaporated is also described.
Type:
Application
Filed:
May 31, 2006
Publication date:
December 14, 2006
Applicants:
CREATEC FISCHER & CO. GMBH, FORSCHUNGSVERBUND BERLIN E.V.