Abstract: A chlorine dioxide gas generating system for sterilizing equipment in a chamber is provided. The system includes a chlorine dioxide gas generating device configured to generate chlorine dioxide gas, a vacuum pump, and a port assembly comprising a port member fluidly coupled to the vacuum pump and configured to be maintained in an interior of the chamber. The vacuum pump is configured to pump the chlorine dioxide gas from the device into the chamber through the port member in order to sterilize the equipment, and after a predetermined period of time, pull a gas other than the chlorine dioxide gas into and out of the chamber at least one time through the port member in order to remove humidity from the chamber and cause the chlorine dioxide gas to be drawn out of the chamber through the port member.

Abstract: A chlorine dioxide gas generating system for sterilizing equipment in a chamber is provided. The system includes a chlorine dioxide gas generating device configured to generate chlorine dioxide gas, a vacuum pump, and a port assembly comprising a port member fluidly coupled to the vacuum pump and configured to be maintained in an interior of the chamber. The vacuum pump is configured to pump the chlorine dioxide gas from the device into the chamber through the port member in order to sterilize the equipment, and after a predetermined period of time, pull a gas other than the chlorine dioxide gas into and out of the chamber at least one time through the port member in order to remove humidity from the chamber and cause the chlorine dioxide gas to be drawn out of the chamber through the port member.

Abstract: A chlorine dioxide gas generating device is provided. The device includes a housing, an anode and a cathode, a first reagent and a second reagent, and a hydrophobic membrane. The housing has a cavity. The anode and the cathode are each coupled to and located within the cavity. The first reagent and the second reagent are each located within the cavity. The first reagent and the second reagent are configured to generate chlorine dioxide gas via electrolysis responsive to an electric current being passed into the anode and the cathode. The hydrophobic membrane is coupled to the housing and is configured to allow the chlorine dioxide gas to exit the housing while preventing fluids from flowing therethrough.

Abstract: A chlorine dioxide gas generating device is provided. The device includes a housing, an anode and a cathode, a first reagent and a second reagent, and a hydrophobic membrane. The housing has a cavity. The anode and the cathode are each coupled to and located within the cavity. The first reagent and the second reagent are each located within the cavity. The first reagent and the second reagent are configured to generate chlorine dioxide gas via electrolysis responsive to an electric current being passed into the anode and the cathode. The hydrophobic membrane is coupled to the housing, and is configured to allow the chlorine dioxide gas to exit the housing while preventing fluids from flowing therethrough.