Patents Assigned to CVD Systems, Inc.
  • Film processing system
    Patent number: 6663716
    Abstract: An apparatus for chemical vapor deposition includes a dispenser for dispensing a precursor to a vaporizer positioned within a vaporization chamber. A delivery conduit joins the vaporization with a process chamber. A flow meter is positioned within the delivery conduit for measuring the flow of precursor through the delivery conduit. A flow controller is likewise positioned within the delivery conduit for controlling the flow of precursor in response to the measured flow rate.
    Type: Grant
    Filed: April 14, 1999
    Date of Patent: December 16, 2003
    Assignee: CVD Systems, Inc.
    Inventors: James F. Loan, Jack P. Salerno
  • Film processing system
    Publication number: 20020076492
    Abstract: An apparatus for chemical vapor deposition includes a dispenser for dispensing a precursor to a vaporizer positioned within a vaporization chamber. A delivery conduit joins the vaporization with a process chamber. A flow meter is positioned within the delivery conduit for measuring the flow of precursor through the delivery conduit. A flow controller is likewise positioned within the delivery conduit for controlling the flow of precursor in response to the measured flow rate.
    Type: Application
    Filed: May 7, 2001
    Publication date: June 20, 2002
    Applicant: CVD Systems, Inc.
    Inventors: James F. Loan, Jack P. Salerno
  • Film processing system
    Patent number: 6296711
    Abstract: An apparatus for chemical vapor deposition includes a dispenser for dispensing a precursor to a vaporizer positioned within a vaporization chamber. A delivery conduit joins the vaporization with a process chamber. A flow meter is positioned within the delivery conduit for measuring the flow of precursor through the delivery conduit. A flow controller is likewise positioned within the delivery conduit for controlling the flow of precursor in response to the measured flow rate.
    Type: Grant
    Filed: October 20, 1999
    Date of Patent: October 2, 2001
    Assignee: CVD Systems, Inc.
    Inventors: James F. Loan, Jack P. Salerno
  • Method for chemical vapor deposition of a material on a substrate
    Patent number: 6136725
    Abstract: A method for chemical vapor deposition includes dispensing a precursor to a vaporizer positioned within a vaporization chamber and delivering a vapor to a process chamber without a carrier gas. A flow meter is positioned within the delivery conduit for measuring the flow rate of precursor through the delivery conduit. A flow controller is likewise positioned within the delivery conduit for controlling the flow of precursor in response to the measured flow rate.
    Type: Grant
    Filed: April 14, 1998
    Date of Patent: October 24, 2000
    Assignee: CVD Systems, Inc.
    Inventors: James F. Loan, Jack P. Salerno