Abstract: An EUV light source and method of operating same is disclosed which may comprise: an EUV plasma production chamber comprising a chamber wall comprising an exit opening for the passage of produced EUV light focused to a focus point; a first EUV exit sleeve comprising a terminal end comprising an opening facing the exit opening; a first exit sleeve chamber housing the first exit sleeve and having an EUV light exit opening; a gas supply mechanism supplying gas under a pressure higher than the pressure within the plasma production chamber to the first exit sleeve chamber. The first exit sleeve may be tapered toward the terminal end opening, and may, e.g., be conical in shape comprising a narrowed end at the terminal end.

Abstract: Systems and methods are disclosed for shaping a laser beam for interaction with a film in which the laser beam travels along a beam path and defines a short-axis and a long-axis. In one aspect, the system may include a first short-axis element having an edge positioned at a distance, d1, along the beam path from the film and a second short-axis element having an edge positioned at a distance, d2, along the beam path from the film, with d2<d1. An optic may be positioned along the beam path between the second element and the film for focusing the beam in the short-axis for interaction with the film. In another aspect, a system may be provided having a mechanism operative to selectively adjust the curvature of one or both of the edges of the short-axis element.

Abstract: Systems and methods are disclosed for shaping laser light as a line beam for interaction with a film that may have an imperfect, non-planar surface. The system may include a beam stop that defines an edge; a sensor that measures a distance between a selected point on a surface of the film and a reference plane and generates a signal representative of the measured distance; and an actuator coupled to the beam stop and responsive to the signal to move a portion of beam stop edge. Movement of the beam stop edge portion shifts a corresponding portion of the focused line beam in a direction normal to the reference plane to produce a line beam that more closely conforms to the surface profile of the film.

Abstract: Systems and methods are disclosed for shaping and homogenizing a laser beam for interaction with a film. The shaping and homogenizing system may include a lens array and a lens that is positioned to receive laser light from the lens array and produce a respective elongated image in a plane for each lens in the lens array. In addition, the system may include a beam stop having an edge that is positioned in the plane, and a moveable mount rotating a lens of the lens array to vary an alignment between one of the elongated images and the beam stop edge.

Abstract: A gas discharge laser and method of operating same is disclosed which may comprise a gas discharge laser chamber support structure comprising a first support arm attached to a mounting table; a gas discharge laser chamber slideably engaging the first support arm; an first optical element sensitive to chamber vibration positioned at a first end of the laser chamber mounted on the mounting table; the laser chamber support structure being without connection to the first optical element. The apparatus and method may also comprise a second optical element sensitive to chamber vibration positioned at the second end of the laser chamber mounted on the mounting table; the laser chamber support structure being without connection to the second optical element. The first optical element may comprise a line narrowing optical arrangement and the second and the second optical element comprising an output coupler.

Abstract: An optical coating and method for coating an optical element are disclosed. The optical element substrate may be made of fused silica and the coating may include a non-fluoride adherence layer such as SiO2 that is deposited on the substrate to overlay and contact a surface of the substrate. The coating may further include a multilayer system having at least one layer of a dielectric fluoride material, the multilayer system overlaying the non-fluoride adherence layer.

Abstract: A corona-discharge type, prelonizer assembly for a gas discharge laser is disclosed. The assembly may include an electrode and a hollow, dielectric tube that defines a tube bore. In one aspect, the electrode may include a first elongated 0o conductive member having a first end disposed in the bore of the tube. In addition, the electrode may include a second elongated conductive member having a first end disposed in the bore and spaced from the first end of the first conductive member. For the assembly, the first and second conductive members may be held at a same voltage potential.

Abstract: A method and apparatus are disclosed for controlling the output of a two chamber gas discharge laser comprising an oscillator gas discharge laser and an amplifier gas discharge laser that may comprise establishing a multidimensional variable state space comprising a coordinate system having at least two coordinates, each coordinate comprising a selected variable representing an operating parameter of the oscillator or the amplifier; tracking a multidimensional operating point in the multidimensional variable state space according to the variation of the selected variables in either or both of the oscillator or the amplifier to determine the position of the multidimensional operating point in the multidimensional state space; determining from the position of the multidimensional operating point in the multidimensional operating space a region from a plurality of defined regions in the multidimensional operating space in which the multidimensional operating point is located and identifying the region.

Abstract: A method of providing the service of obtaining information for a client is disclosed, which may comprise, providing a search service brokering internet location; providing an information search identification internet location accessible on or through the search service brokering internet location; providing an information search reference internet location associated with the information search identification internet location; and providing access to a searcher to the information search reference internet location to log in a reference. The search service brokering internet location may comprise a search service broker web-site; and the search identification internet location may comprise a search service broker web-site search web-page; and, the search reference internet location may comprise a search service broker web-site reference web-page. The method may also comprise date stamping the log in of a reference.

Abstract: A system for a monitoring lithography lasers at integrated circuit fabrication plants. Each laser at each fabrication plant has associated with it a terminal server. With respect to each fabrication plant a central control server unit is in communication with each of the lasers through a local area network. Information from the lasers is collected by the central control server unit and the information is used to provide summary information which is made available in a web site format to interested parties having access authorization.

Abstract: Feedback timing control equipment and process for an injection seeded modular gas discharge laser. A preferred embodiment is a system capable of producing high quality pulsed laser beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 to 10 mJ or greater for integrated outputs of about 20 to 40 Watts or greater. The feedback timing control is programmed to permit in some circumstances discharges timed so that no significant laser energy is output from the system. Use of this technique permits burst mode operation in which the first discharge of a burst is a no-output discharge so that timing parameters for each of the two chambers can be monitored before the first laser output pulse of the burst. Two separate discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber.

Abstract: An electric discharge, narrow band gas laser with improvements in wavelength stability. Improvements result from reduced laser beam directional fluctuations or fast correction of those fluctuations. Applicant has discovered, using an extremely sensitive knife edge optical technique, that gas discharge laser windows in a trapezoidal configuration were causing slight wavelength perturbations when laser gas density varied during laser operation. The optical technique involves using test laser beam directed through the discharge region of the gas discharge laser, blocking a portion of the beam with a knife edge and measuring the non-blocked portion of the beam to monitor beam deflection. With this technique, Applicant can measure beams deflection with an accuracy of about 0.3 microradians and with a time response of about 1 microsecond.

Abstract: A method and apparatus for operating a very high repetition gas discharge laser system magnetic switch pulsed power system is disclosed, which may comprise a solid state switch, a charging power supply electrically connected to one side of the solid state switch; a charging inductor electrically connected to the other side of the solid state switch; a deque circuit electrically in parallel with the solid state switch comprising a deque switch; a peaking capacitor electrically connected to the charging inductor, a peaking capacitor charging control system operative to charge the peaking capacitor by opening the deque switch and leaving the solid state switch open and then shutting the solid state switch. The solid state switch may comprise a plurality of solid state switches electrically in parallel.

Abstract: A apparatus and method are disclosed which may comprise a fluorine gas discharge laser system and electrode support system which may comprise a first electrode electrically connected to a source of high voltage; a first insulating mechanism insulating the first electrode from ground; a second electrode electrically insulated from the source of high voltage and together with the first electrode forming an elongated discharge region between portions of the first and second electrodes respectively extending along a longitudinal axis of each of the first and second electrodes, defining electrode discharge receiving region end portions; a plurality of current return tines electrically connected to the second electrode and to ground, the tines distributed along the longitudinal extent of the elongated discharge region; a second insulating mechanism electrically isolating the second electrode from ground except through the plurality of current return tines.

Abstract: Systems and methods are disclosed for reducing the influence of plasma generated debris on internal components of an EUV light source. In one aspect, an EUV meteorology monitor is provided which may have a heater to heat an internal multi-layer filtering mirror to a temperature sufficient to remove deposited debris from the mirror. In another aspect, a device is disclosed for removing plasma generated debris from an EUV light source collector mirror having a different debris deposition rate at different zones on the collector mirror. In a particular aspect, an EUV collector mirror system may comprise a source of hydrogen to combine with Li debris to create LiH on a collector surface; and a sputtering system to sputter LiH from the collector surface. In another aspect, an apparatus for etching debris from a surface of a EUV light source collector mirror with a controlled plasma etch rate is disclosed.

Abstract: Apparatus and methods are disclosed for forming plasma generated EUV light source optical elements, e.g., reflectors comprising MLM stacks employing various binary layer materials and capping layer(s) including single and binary capping layers for utilization in plasma generated EUV light source chambers, particularly where the plasma source material is reactive with one or more of the MLM materials.

Abstract: An excimer laser with a laser chamber containing a circulating laser gas containing fluorine and long-life, annealed, copper alloy electrodes. Electrode lifetime is increased by annealing them after the electrodes are machined. This annealing relieves the surface stress caused by the machining operation and reduces the exposed metallic grain boundary length per unit area on the surface of the electrodes, which provides substantial reduction in erosion caused by fluorine chemical attack. Annealing after machining also reduces the stress throughout the bulk of the electrode material. In preferred embodiments the anode is a copper-aluminum alloy and the cathode is a copper-zinc alloy.

Abstract: A beam delivery unit and method of delivering a laser beam from a laser light source for excimer or molecular fluorine gas discharge laser systems in the DUV and smaller wavelengths is disclosed, which may comprise: a beam delivery enclosure defining an output laser light pulse beam delivery pat from an output of a gas discharge laser to an input of a working apparatus employing the light contained in the output laser light pulse beam; a purge mechanism operatively connected to the beam delivery enclosure; an in-situ beam parameter monitor and adjustment mechanism within the enclosure, comprising a retractable bean redirecting optic; a beam analysis mechanism external to the enclosure; and, a retraction mechanism within the enclosure and operable from outside the enclosure and operative to move the retractable beam redirecting optic from a retracted position out of the beam path to an operative position in the beam path.

Abstract: An DPP EUV source is disclosed which may comprise a debris mitigation apparatus employing a metal halogen gas producing a metal halide from debris exiting the plasma. The EUV source may have a debris shield that may comprise a plurality of curvilinear shield members having inner and outer surfaces connected by light passages aligned to a focal point, which shield members may be alternated with open spaces between them and may have surfaces that form a circle in one axis of rotation and an ellipse in another. The electrodes may be supplied with a discharge pulse shaped to produce a modest current during the axial run out phase of the discharge and a peak occurring during the radial compression phase of the discharge. The light source may comprise a turbomolecular pump having an inlet connected to the generation chamber and operable to preferentially pump more of the source gas than the buffer gas from the chamber.

Abstract: An EUV light source collector erosion mitigation system and method is disclosed which may comprise a collector comprising a multilayered mirror collector comprising a collector outer surface composed of a capping material subject to removal due to a removing interaction with materials created in an EUV light-creating plasma; a replacement material generator positioned to deliver replacement material comprising the capping material to the collector outer surface at a rate sufficient to replace the capping material removed due to the removing interaction. The replacement material generator may comprise a plurality of replacement material generators positioned to respectively deliver replacement material to a selected portion of the collector outer surface, which may comprise a sputtering mechanism sputtering replacement capping material onto the collector outer surface.