Patents Assigned to Cytopeia
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Patent number: 8223445Abstract: The present invention provides an optical analyzer having illumination optics that include a light source, such as a laser or other source, adapted to emit a collimated, or approximately collimated, light beam, and a focusing lens that focuses the beam onto a focus spot within a detection region, wherein the focusing lens is mounted in a lens positioning apparatus that allows for precise positioning of the focus spot within the detection region. The lens positioning apparatus comprises a lens holder adapted to rotate through a small angle around a pivot axis parallel to the optical path, such that the lens holder rotates in a plane perpendicular to the optical path, and an actuator adapted to provide an angular displacement of the lens holder around the pivot axis. The lens holder holds the focusing lens at a first distance from the pivot axis, and is coupled to the actuator at a second distance from the pivot axis, wherein the second distance is larger than the first distance.Type: GrantFiled: August 31, 2010Date of Patent: July 17, 2012Assignee: CytopeiaInventor: Ger van den Engh
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Patent number: 7728974Abstract: An enhanced detection system can eliminate use of a sheath fluid by selecting which particles that pass through an sensing region to detect parametric characteristics thereof based upon position of each particle while it is in a sensing region relative to one or more predetermined positions, such as an in-focus position relative to one or more light beams directed into the sensing region, to enhance accuracy and robustness of particle parametric characteristics detection.Type: GrantFiled: February 7, 2008Date of Patent: June 1, 2010Assignee: Cytopeia, Inc.Inventor: Gerrit van den Engh
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Patent number: 7643142Abstract: The invention provides an apparatus including (a) a frame having a boundary plane; (b) a flow chamber supported by the frame, the flow chamber placed a distance from the boundary plane; (c) a radiation source, the radiation source directed away from the flow chamber and away from the exterior side of the boundary plane, and (d) a first reflective surface placed to direct a radiation beam in a path crossing the boundary plane to the flow chamber; (e) one or more reflective surfaces placed to direct a radiation beam from the radiation source to the first reflective surface, the path from the radiation source to the flow chamber being at least 1.5 times the distance from the flow chamber to the boundary plane.Type: GrantFiled: January 18, 2008Date of Patent: January 5, 2010Assignee: CytopeiaInventor: Ger van den Engh
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Publication number: 20080316481Abstract: The invention provides an apparatus including (a) a frame having a boundary plane; (b) a flow chamber supported by the frame, the flow chamber placed a distance from the boundary plane; (c) a radiation source, the radiation source directed away from the flow chamber and away from the exterior side of the boundary plane, and (d) a first reflective surface placed to direct a radiation beam in a path crossing the boundary plane to the flow chamber; (e) one or more reflective surfaces placed to direct a radiation beam from the radiation source to the first reflective surface, the path from the radiation source to the flow chamber being at least 1.5 times the distance from the flow chamber to the boundary plane.Type: ApplicationFiled: January 18, 2008Publication date: December 25, 2008Applicant: CytopeiaInventor: Ger van den Engh
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Publication number: 20080186479Abstract: An enhanced detection system can eliminate use of a sheath fluid by selecting which particles that pass through an sensing region to detect parametric characteristics thereof based upon position of each particle while it is in a sensing region relative to one or more predetermined positions, such as an in-focus position relative to one or more light beams directed into the sensing region, to enhance accuracy and robustness of particle parametric characteristics detection.Type: ApplicationFiled: February 7, 2008Publication date: August 7, 2008Applicant: Cytopeia IncorporatedInventors: Jarred E. Swalwell, Gerrit van den Engh, Timothy W. Petersen
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Patent number: 7345758Abstract: The invention provides an apparatus including (a) a frame having a boundary plane; (b) a flow chamber supported by the frame, the flow chamber placed a distance from the boundary plane; (c) a radiation source, the radiation source directed away from the flow chamber and away from the exterior side of the boundary plane, and (d) a first reflective surface placed to direct a radiation beam in a path crossing the boundary plane to the flow chamber; (e) one or more reflective surfaces placed to direct a radiation beam from the radiation source to the first reflective surface, the path from the radiation source to the flow chamber being at least 1.5 times the distance from the flow chamber to the boundary plane.Type: GrantFiled: May 17, 2001Date of Patent: March 18, 2008Assignee: CytopeiaInventor: Ger van den Engh
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Publication number: 20070269348Abstract: An enhanced droplet flow cytometer system and method allows for improvement in performance, maintainability, and adaptability to operational conditions encountered. The enhanced system uses an oscillator positioned and configured to impart vibrational energy transverse to fluid flow. In some implementations, an oscillator provides a radial pressure field to the sheath fluid to avoid exciting resonances in the system. Implementations use removable recessed nozzles to aid in cleaning and replacement without imparting appreciable turbulence to fluid flow during operation.Type: ApplicationFiled: May 19, 2006Publication date: November 22, 2007Applicant: Cytopeia IncorporatedInventors: Ger J. van den Engh, Timothy W. Petersen, Jarred E. Swalwell