Abstract: The function of the key element of the SMA, is based on a mutual alternating slipping of two systems of filaments. Its contraction is caused by the attractive effect of van der Waal's forces between the functional particles among the filaments. The relaxation is attained through the repulsive effect of the electrostatic repulsive forces between the functional particles. The alternating change of ionic concentration in the area of the particles results in the alternating function of van der Waal's attraction and repulsive electrostatic forces. The size and material of the particles, their configuration and working temperature must be specifically optimized. The total contraction of the key element results from the summation of its partial contractions. The total force and contraction of the SNA result from the summation of the key elements in the parallel (collateral) and/or serial (linear ranked) arrangements, respectively.

Abstract: A method and an apparatus for measuring the dose, the dose rate and/or the composition of radiation is disclosed. In the method, a detector means is exposed to a radiation environment, the detector means comprising an array of radiation sensing detector elements. The detector means is switched in a sensitive state for the duration of a sensitive time period, and during said sensitive time period, an interaction pattern generated by individual radiation quanta interacting with one or more of the detector elements is recorded. The duration of the sensitive time period can be precisely adapted to the intensity of the radiation that has to be recorded. The interaction pattern is analyzed to distinguish individual radiation quanta received during the sensitive time period, and a radiation category is assigned to each of the distinguished radiation quanta based on its corresponding interaction pattern.