Patents Assigned to Dae Ryung Vacumm Co. Ltd.
  • Patent number: 4879017
    Abstract: A glow discharge magnetron sputtering apparatus having an improved multi-rod type target which produces a more uniform and higher rate of deposition on a substrate than obtainable in prior art devices, and which is particularly suitable for use in connection with the deposition of the magnetic materials. The apparatus includes a cathode comprising a cathode body, a backing plate connected removably with the cathode body, a copper-made common plate bonded to the bottom of the backing plate, and a target composed of a plurality of rods of material to be sputtered. Each rod has a sputtering surface of hemisphere form on the apex thereof.
    Type: Grant
    Filed: November 29, 1988
    Date of Patent: November 7, 1989
    Assignee: Dae Ryung Vacumm Co. Ltd.
    Inventor: Hee-Yong Lee