Patents Assigned to Dai-ichi Kogyo Seiyakn Co., Ltd.
  • Patent number: 6765084
    Abstract: The present invention provides a novel production process for an ethylene oxide resin, in which, when the ethylene oxide resin is obtained, it is arranged that the resin should contain no antistatic agent, and further its water content is also easily controlled in not more than a definite amount, and the thermal damage of the above resin is prevented, and besides, the reduction of the cost can also be actualized. The production process for an ethylene oxide resin, according to the present invention, comprises the step of carrying out devolatilization of a solvent from a polymerization reaction liquid containing the solvent, thereby obtaining the ethylene oxide resin; with the production process being characterized by arranging that: after the devolatilization, the resin should have a solvent concentration of 0.01 to 30 weight % and a water content of not more than 200 ppm, and the resin should contain no antistatic agent.
    Type: Grant
    Filed: January 2, 2003
    Date of Patent: July 20, 2004
    Assignees: Dai-ichi Kogyo Seiyakn Co., Ltd., Nippon Shokubai Co., Ltd.
    Inventors: Michiyuki Kono, Manabu Kikuta, Masahito Nishiura, Fumihide Tamura, Shigetaka Takamiya, Taketo Toba