Abstract: The invention relates to a method of fabricating an optical fiber-processing phase mask in which a stitching error ascribable to a deterioration in the wavelength selectivity of the optical fiber diffraction grating to be fabricated is reduced. At an exposure step, a writing stage 5 with a phase mask blank 10 placed thereon is continuously fed in one direction while portions of the phase mask blank corresponding to grooves 26 or strips 27 in a direction perpendicular to the direction of feeding are sequentially scanned with writing beams 14, whereby the entire area of the phase mask blank 10 to be written is continuously written.