Abstract: Disclosed is a curable composition for nanoimprinting, which includes one or more polymerizable monomers, in which one or more monofunctional radically polymerizable monomers occupy 90 percent by weight or more of the one or more polymerizable monomers, and the one or more monofunctional radically polymerizable monomers give a polymer having a glass transition temperature of 25° C. or higher. The one or more monofunctional radically polymerizable monomers are preferably at least one compound selected from (meth)acrylic ester compounds, styrenic compounds, and vinyl ether compounds.

Abstract: A process for allowing an oxidation reaction efficiently to produce an object aromatic carboxylic acid with an efficient productivity by improving a catalyst activity even in the presence of a relatively small amount of a catalyst is provided. The process comprises oxygen-oxidizing an aromatic compound having an alkyl group and/or an alkylene group as a substrate in the presence of a catalyst containing a cyclic imino unit having an N—OR group (wherein R represents a hydrogen atom or a protecting group for a hydroxyl group) and a transition metal co-catalyst (a cobalt compound, a manganese compound, and a zirconium compound) to produce the aromatic carboxylic acid corresponding to the aromatic compound. The oxidation reaction is carried out with feeding a mixture of the catalyst and at least one member selected from the group consisting of the substrate, a reaction intermediate (e.g., a ketone and an aldehyde), and a reaction product (e.g.

Abstract: A gas generating composition exhibiting good slag forming ability is provided. The gas generating composition includes a fuel ranging from 10 to 60% by mass, an oxidizing agent ranging from 10 to 70% by mass, and a cooling agent (other than iron oxide) ranging from 1 to 20% by mass. The cooling agent has a volume mean diameter (D50) of 10 to 70 ?m and a volume mean diameter at cumulative of 10% (D10) of equal to or greater than 5 ?m. The cooling agent acts to decrease the combustion temperature and improve slag forming ability.

Abstract: The present invention provides a plated resin molded article having a high adhering strength of a plating layer. Specifically, it provides a plated resin molded article that has a metal plating layer on the surface of a thermoplastic resin molded article comprising a composition that contains (A) 10 to 90 mass % of a matrix resin that has a water absorption after 24 hours in 23° C. water (ISO62) of at least 0.6% and (B) 90 to 10 mass % of a non-styrenic resin that has a water absorption after 24 hours in 23° C. water (ISO62) of less than 0.6%, wherein the thermoplastic resin molded article is not subjected to etching with a heavy metal-containing acid.

Abstract: Disclosed is a separating agent for optical isomer which is excellent in optical separation ability. Specifically disclosed is a separating agent for optical isomer containing: an inclusion complex including a ?-conjugated polymer in a polymer compound having a hydroxy group or an amino group; and a carrier, the inclusion complex being carried by the carrier.

Abstract: A tobacco filter contains from 0.5 to 95% by mass of magnesium aluminometasilicate.

Abstract: This invention provides a separating agent for optical isomers, which has high asymmetry recognition ability and can be used particularly at a high flow rate when used for the separation of the optical isomers, and a separation column for optical isomers having the same. This invention provides: a separating agent for optical isomers which is used for separation of optical isomers in a sample comprising the optical isomers, which is comprising a monolithic inorganic type carrier having a meso pore formed on an inner wall surface of a specific macropore, and a polysaccharide or a polysaccharide derivative supported on the monolithic inorganic type carrier, wherein the meso pore has a pore size of 6 to 100 nm; and a separation column for optical isomers in which the separating agent for optical isomers is held in a column tube.

Abstract: This invention provides a separating agent for optical isomers, which has high asymmetry recognition ability and can be used particularly at a high flow rate when used for the separation of the optical isomers, and a separation column for optical isomers having the same. This invention provides: a separating agent for optical isomers which is used for separation of optical isomers in a sample comprising the optical isomers, which is comprising a monolithic inorganic type carrier having a meso pore formed on an inner wall surface of a specific macropore, and a polysaccharide or a polysaccharide derivative supported on the monolithic inorganic type carrier, wherein the meso pore has a pore size of 6 to 100 nm; and a separation column for optical isomers in which the separating agent for optical isomers is held in a column tube.

Abstract: An optical semiconductor sealing resin composition includes a rubber-particle-dispersed epoxy resin (A) containing an alicyclic epoxy resin and, dispersed therein, rubber particles, in which the rubber particles comprise a polymer including one or more (meth)acrylic esters as essential monomeric components and have a hydroxyl group and/or a carboxyl group in a surface layer thereof as a functional group capable of reacting with the alicyclic epoxy resin, the rubber particles have an average particle diameter of 10 nm to 500 nm and a maximum particle diameter of 50 nm to 1000 nm, and the difference in refractive index between the rubber particles and a cured article obtained from the optical semiconductor sealing resin composition is within ±0.02. The optical semiconductor sealing resin composition can give a cured article which exhibits excellent cracking resistance while maintaining satisfactory thermal stability and high transparency.

Abstract: Disclosed is a method for producing a resin solution for photoresists, which includes the steps of heating and thereby aging a solution at 30° C. to 90° C. for 30 minutes or longer, the solution containing, in a solvent, a photoresist resin capable of being alkali-soluble by the action of an acid; and filtering the aged solution through a filter medium having a pore size of 1 ?m or less. The method gives a photoresist composition having good filterability which enables uniform patterning. The method also gives a resin solution for photoresists which is stable over a long time, namely, a resin solution for photoresists which maintains good filterability even after long-term storage.

Abstract: A gas generator includes, a housing having a circumferential wall, a first end, and a second end, an inner tube member disposed in the housing, an outer space thereof being a combustion chamber, an outer circumference cylindrical member being such that one end opening abuts against a bottom plate of the second end, an annular porous member provided between the outer circumference cylindrical member and the cup-shaped inner tube member so as to form a space above the combustion chamber, a gas discharge path formed between the outer circumference cylindrical member and an inner wall surface of the circumferential wall portion of the housing; a communicating portion communicating the space and the gas discharge path, and being provided in the other end opening of the outer circumference cylindrical member; and a total cross-sectional area of the gas discharge port being smaller than a smallest cross-sectional area of a gas pathway.

Abstract: A process produces an amide or lactam by subjecting an oxime compound to rearrangement in a solvent in the presence of: at least one catalyst selected from the group consisting of an aromatic compound (A1) containing a leaving group bound to a carbon atom constituting the aromatic ring, the aromatic ring including, as a constitutive atom thereof, a heteroatom or including, as a constitutive atom thereof, a carbon atom bound to an electron-withdrawing group, and a compound (A2) containing a structure of Formula (1): -G-LA (1) wherein G represents P, N, S, B or Si atom; and LA represents a leaving group, wherein G is bound to one or more atoms or groups in addition to LA; and a co-catalyst including a halogen-containing organic acid, to give the corresponding amide or lactam, wherein, when the aromatic compound (A1) alone is used as the catalyst, the solvent is at least one solvent selected typically from hydrocarbon solvents.

Abstract: A cylindrical filter for a gas generator includes, a plurality of layers made of a porous metal plate in which a compressive strength (S1) of a predetermined region in at least one end in the height direction is set smaller than a compressive strength (S2) of a portion other than the S1 region, the porous metal plate being selected from the group consisting of expanded metal, metal lath, and perforated metal, and the S1 region corresponding to a region of 5 to 20% in length from both ends with respect to the overall height.

Abstract: Disclosed is a monomer having an electron-withdrawing substituent and a lactone skeleton, represented by Formula (1), wherein Ra represents, e.g., hydrogen or an alkyl group having 1 to 6 carbons; R1 represents, e.g., a halogen or an alkyl or haloalkyl group having 1 to 6 carbons; “A” represents an alkylene group having 1 to 6 carbons, oxygen, sulfur, or is nonbonding; “m” denotes an integer of 0 to 8; Xs each represent an electron-withdrawing substituent; “n” denotes an integer of 1 to 9; and Y represents a bivalent organic group having 1 to 6 carbons. The monomer is useful as a monomer component typically for a highly functional polymer, because, when the monomer is applied to a resist resin, the resin is stable and resistant to chemicals, is highly soluble in organic solvents, and has improved hydrolyzability and/or solubility in water after hydrolysis.

Abstract: Provided is a basic metal nitrate suitable as an oxidizing agent for a gas generating agent, which is a basic metal nitrate having a good thermal stability and meeting at least one requirement of the following (a) to (d): (a) a particle diameter of 0.5 to 40 ?m; (b) a degree of crystallinity having 0.4 deg or less of a half band width of the peak in the X-ray analysis; (c) an initiation temperature of weight loss being 220° C. or higher according to TG-DTA analysis; and (d) an impurity content of 1,000 ppm or less based on Na atom. Further provided is a gas generating composition which has a low toxicity, a high burning rate and a low combustion temperature and which is used in a gas generator for an air bag. The gas generating composition comprises (a) tetrazole derivatives, guanidine derivatives or a mixture thereof, (b) a basic metal nitrate and (c) a binder and/or a slag-forming agent.

Abstract: A method comprising liquefying a gas to thereby obtain a liquefied gas; injecting a sample into a mobile phase containing a solvent and a supercritical fluid formed from the liquefied gas; passing this mobile phase through a column so that the mobile phase containing desired substance is divided into the solvent and the gas; and separating the desired substance from the solvent, wherein when the pressure of the gas divided from the mobile phase is higher than the pressure of the gas fed for formation of the liquefied gas from gas supply device, the gas divided from the mobile phase is liquefied. Further, there is provided a vapor liquid separator for use in the method.

Abstract: The present invention provides a gas generator for a restraining apparatus of a vehicle, including a combustion chamber, a tabular cushion member being disposed on a bottom portion of the combustion chamber, the solid gas generating agent as a gas generating source, being charged in the combustion chamber inside the gas generator together with the cushion member, the combustion chamber being substantially in a cup shape in which an inner diameter (D1) of an opening is smaller than an inner diameter (D2) of the bottom portion, the cushion member including a circular portion serving as a base part and a plurality of protrusions protruding from a peripheral edge of the circular portion, an outer diameter (d1) of the circular portion and the inner diameter (D1) of the opening satisfying a relationship of d1<D1, and an outer diameter (d2) including the protrusions satisfying relationships of d2>D1 and d2?D2.

Abstract: Disclosed is a photocurable resin composition for nanoimprint, containing a curable monomer component with or without a binder resin. The composition further contains 0.001 to 5 parts by weight of a compound having a reactive functional group and a hydrophobic functional group in the same molecular skeleton, per 100 parts by weight of the total amount of the curable monomer component and binder resin. Preferably, the reactive functional group is at least one functional group selected from the group consisting of hydroxyl groups, epoxy groups, vinyl ether groups, oxetanyl groups, alkoxysilane groups, and free-radically polymerizable vinyl groups, and the hydrophobic functional group is at least one functional group selected from the group consisting of fluorine-containing groups, alkylsilane groups, alicyclic hydrocarbon groups, and aliphatic hydrocarbon groups having 4 or more carbon atoms.

Abstract: Disclosed is a process for producing a photoresist polymeric compound. The process includes the steps of polymerizing a monomer mixture containing at least one monomer selected from a monomer (a) containing a group capable of leaving with an acid to allow the polymeric compound to be soluble in an alkali, a monomer (b) having a lactone skeleton, and a monomer (c) having a hydroxyl-containing alicyclic skeleton, to give a polymer; passing a solution containing the polymer through a filter including a porous membrane having an anion-exchange group to give a polymer solution; and thereafter passing the polymer solution through a filter including a porous membrane having a cation-exchange group. The polymer solution before passing through the filter including a porous membrane having a cation-exchange group preferably has a content of metals of 1000 ppb by weight or less per the weight of the polymer.

Abstract: A polymer for lithographic purposes has at least a repeating structural unit represented by following General Formula (I). In Formula (I), R1, R3, R4, and R6 each independently represent hydrogen atom, a halogen atom, cyano group, an alkyl group, or a haloalkyl group; R2 and R5 each independently represent hydrogen atom, cyano group, etc.; X1 and X2 each independently represent single bond, or a substituted or unsubstituted bivalent alkylene, alkenylene, or cycloalkylene group, etc.; X3 and X4 each independently represent single bond or —CO—; R7, R8, R9, and R10 each independently represent hydrogen atom, an alkyl group, or a cycloalkyl group. The polymer for lithographic purposes shows good balance between line edge roughness (LER) and etching resistance and allows very fine and uniform patterning.