Patents Assigned to Daikin Industris, Ltd.
  • Etchant composition
    Patent number: 4582624
    Abstract: An aqueous etchant composition comprising hydrogen fluoride, ammonium fluoride and a surfactant selected from a group consisting of fluorine-containing carboxylic acids and their salts, with which very minute and complicated pattern can be etched onto an oxidized silicon film on a semiconductor substrate.
    Type: Grant
    Filed: August 9, 1984
    Date of Patent: April 15, 1986
    Assignee: Daikin Industris, Ltd.
    Inventors: Naonori Enjo, Koji Tamura