Abstract: A cleaning tank defining therein a cleaning chamber adapted to receive an article to be cleaned and having an upper opening for carrying the article into and out of the cleaning chamber, a plurality of small holes provided in the bottom wall of the cleaning chamber and communicated with an outlet port, and at least one inlet port for introducing a cleaning liquid into the cleaning tank and into the cleaning chamber only through the upper opening thereof.

Abstract: A carrier cleaning and drying apparatus for cleaning and drying a wafer processing carrier has a cleaning tank for accommodating the carrier and a high-pressure injection nozzle disposed in an upper portion of the cleaning tank and for injecting a pressurized cleaning solution. This high-pressure injection nozzle is moved within a plane and the cleaning solution is injected at high pressure therefrom, thereby removing dust adhering to the inner and outer surfaces of the carrier by means of the force of injection. A supporting and rotating mechanism portion is also provided which, during cleaning of the carrier, swings the carrier at a predetermined angle, and, after cleaning, effects drying by spinning the carrier at high speed.