Abstract: A three dimensional (3D) virtual shape modeling method for an object produced through a semiconductor process is provided, which can model a 3D shape of an object produced through processes such as deposition, etching, and so on that are used in a semiconductor or planar display panel manufacturing process. Specifically, convenient modeling can be performed when forming a layer produced through deposition and then etching on a non-flat, preceding layer, by using two dimensional projection method.
Type:
Application
Filed:
February 24, 2016
Publication date:
September 1, 2016
Applicant:
Daouincube, Inc.
Inventors:
Tae Hwa LIM, Dong Wan KANG, Hyun Cheol KIM