Patents Assigned to Daphne Technology SA
  • Patent number: 12520414
    Abstract: There is provided a drive circuit for a dielectric barrier discharge device. The drive circuit comprises: a power supply connectable in use across a dielectric discharge gap, the dielectric discharge gap providing a capacitance; and an inductance between the power supply and the dielectric discharge gap when connected thereby establishing a resonant tank in use, wherein power is provided in use to the tank in pulse-trains and only during a pulse-train, a pulse frequency of each pulse-train being tuneable in use to a resonant frequency of the tank, power provided by each pulse-train charging and maintaining the tank to a threshold at which discharge ignition occurs, discharge ignition events per pulse-train being limited to a maximum number based on the drive circuit being arranged in use to prohibit each pulse-train transferring power to the resonant tank after the maximum number has occurred.
    Type: Grant
    Filed: November 19, 2021
    Date of Patent: January 6, 2026
    Assignee: DAPHNE TECHNOLOGY SA
    Inventors: Juan Mario Michan, William Jamieson Ramsay, Dominik Neumayr
  • Patent number: 12415158
    Abstract: There is provided a dielectric barrier electrical discharge apparatus, system and method. The apparatus comprises at least two electrodes arranged in use to provide at least one anode and at least one cathode an electric field thereby being establishable therebetween, the at least two electrodes being separated to allow a fluid to be present between the electrodes in use. At least one of the electrodes has a dielectric portion connected to at least part of said electrode, and a sub-macroscopic structure is connected to at least one of the electrodes or dielectric portion.
    Type: Grant
    Filed: July 6, 2021
    Date of Patent: September 16, 2025
    Assignee: DAPHNE TECHNOLOGY SA
    Inventors: William Jamieson Ramsay, Juan Mario Michan, Henrik Westermark
  • Publication number: 20240408541
    Abstract: There is provided an apparatus and for removing pollutants from a gas. The apparatus comprises a gas flow path along which gas passes from an inlet to an outlet in use; and a cooling device on the gas flow path and orientated so as to direct the gas flow path upward towards the outlet. The apparatus is arranged in use to provide water and gaseous reagent to gas upstream of the cooling device in quantities based on one or more properties of the gas and a cooling capability of the cooling device so as to cause the reagent to react with one or more constituents of the gas to produce a reaction product and to cause the gas to reach its saturation point when passing through the cooling device thereby causing water in the gas to capture the reaction product, condense and pass out of the gas.
    Type: Application
    Filed: October 13, 2022
    Publication date: December 12, 2024
    Applicant: Daphne Technology SA
    Inventors: William Jamieson Ramsay, Juan Mario Michan, Steven Iglesiias
  • Publication number: 20240316494
    Abstract: There is provided a dielectric barrier electrical discharge apparatus and corresponding system and method.
    Type: Application
    Filed: July 8, 2022
    Publication date: September 26, 2024
    Applicant: DAPHNE TECHNOLOGY SA
    Inventors: Juan Mario Michan, William Jamieson Ramsay, Dominik Neumayr
  • Patent number: 11123689
    Abstract: The present disclosure relates to methods of scrubbing of gas by exposure to electrons and apparatuses therefor. Such methods and apparatuses could be used to reduce harmful emissions created by the burning of fossil fuels, e.g. to power ships. According to one aspect there is provided apparatus for electron irradiation scrubbing, said apparatus comprising: an anode; a cathode a nanostructure located between said anode and said cathode, said nanostructure being configured to field-emit electrons in response to the presence of an electric field between the anode and cathode when a potential difference is established therebetween; and a housing coupled to said nanostructure and configured for locating the nanostructure so that it extends into a container containing gas to be scrubbed such that an interior of said container can be exposed to said electrons. According to further aspects there are provided systems comprising such apparatus and methods making use of it.
    Type: Grant
    Filed: October 3, 2016
    Date of Patent: September 21, 2021
    Assignee: Daphne Technology SA
    Inventor: Juan Mario Michan