Abstract: The invention relates to inlet elements at disposal devices for process exhaust gases containing pollutants, as are produced in particular in semiconductor component fabrication. The solution is intended to make it possible to avoid deposits in the inlet region for process exhaust gases at disposal devices. To achieve this object, the inlet elements according to the invention are designed in such a way that a porous, gas-permeable wall element, via which an inert gas can be fed into the interior of the inlet element routing process exhaust gas, is present at the inlet element.

Abstract: In a device for the purification of exhaust gases, especially exhaust gases consisting of fluorine-containing compounds, bore holes (7,8) are made in a ring burner (5) for the separate supply of combustion gas and oxygen on a single hole circle around a central exhaust gas supply (9). The ring burner is arranged in a combustion chamber (1). The combustion chamber is closed up to an annular gap (20) between a cylindrical jacket (4) and a front face (16). Additional oxygen or additional air is introduced into the annular gap (20).