Patents Assigned to David Paul Merritt
  • HIGHLY SENSITIVE POSITIVE PHOTORESIST COMPOSITIONS
    Publication number: 20010049071
    Abstract: Positive resists sensitive to UV, electron beam, and x-ray radiation which are alkaline developable are formulated from a polymer material comprising recurrent structures having alkaline soluble groups pendent to the polymer backbone, a portion of which groups are substituted with acid labile groups.
    Type: Application
    Filed: October 21, 1999
    Publication date: December 6, 2001
    Applicant: David Paul Merritt
    Inventors: DAVID PAUL MERRITT, WAYNE MARTIN MOREAU, ROBERT LAVIN WOOD