Patents Assigned to Davis & Wilder, Inc.
  • Plasma etching apparatus
    Patent number: 4230515
    Abstract: An improvement in radial flow parallel plate plasma etchers has been developed in order to improve the uniformity of etching across the entire radial plate dimension. The improvement comprises radially decreasing the spacing between the electrodes wherein the gap between the electrodes is greatest at the center and smallest at the circumference of the electrodes.
    Type: Grant
    Filed: July 27, 1978
    Date of Patent: October 28, 1980
    Assignee: Davis & Wilder, Inc.
    Inventor: John Zajac