Patents Assigned to Demetron Gesellschaft Fuer Elektronik-Werkstoffe m.b.H.
  • Patent number: 4943362
    Abstract: Sputter targets of bismuth with 0.2 to 10% by weight manganese for producing optically transparent surface layers which reflect heat in combination with silver layers on panes of glass and of plastic achieve an improved resistance to UV in silver layers if the manganese is present in the form of the intermetallic compound BiMn in an even, finely dispersed distribution within the metallic bismuth matrix.
    Type: Grant
    Filed: May 19, 1988
    Date of Patent: July 24, 1990
    Assignee: Demetron Gesellschaft fuer Elektronik-Werkstoffe m.b.H.
    Inventors: Guenther Schlamp, Klaus P. Gall, Adolf Langer, Georg Ptaschek
  • Patent number: 4803046
    Abstract: A method for working high-purity, mechanically strong targets containing brittle phases in the equilibrium state. First a porous body is manufactured from part of the component with a higher melting point and thereafter the porous body is impregnated with an impregnating composition corresponding to the remainder of the components required to form the ultimate composition of the target. The composition of the impregnation material must be selected in such a manner that the reaction between the impregnation material and the porous body shall produce no phases of low melting points.
    Type: Grant
    Filed: August 14, 1987
    Date of Patent: February 7, 1989
    Assignee: Demetron Gesellschaft Fuer Elektronik-Werkstoffe m.b.H.
    Inventors: Juergen Hausselt, Stephan-U. Schittny, Dieter Kaufmann