Patents Assigned to Dentkist Co., Ltd.
  • Patent number: 6573312
    Abstract: The invention relates to a photo-cured dental pit and fissure sealant composition for caries prevention: i) based on the multifunctional prepolymer mixture of 2,2-bis-(4-(2-hydroxy-3-methacryloyloxypropoxy)phenyl)propane (“Bis-GMA”), which has conventionally been used as dental pit and fissure sealant for caries prevention, and a multifunctional prepolymer formed by substituting hydrogen atoms in hydroxyl group with methacrylate groups in the Bis-GMA molecules; and ii) comprising a diluent, an inorganic filler, a photoinitiation system, and other additives. The dental pit and fissure sealant composition of the present invention is based on a multifunctional prepolymer mixture and has better physical and mechanical properties and biocompatibility than a conventional composition based on Bis-GMA only.
    Type: Grant
    Filed: December 29, 2000
    Date of Patent: June 3, 2003
    Assignee: Dentkist Co. Ltd.
    Inventors: Dong-Keun Han, Kwang-Duk Ahn, Jin-Hee Jeong
  • Patent number: 6339113
    Abstract: The invention relates to a photopolymerizable composite resin composition for dental restoration i) based on the multifunctional prepolymer mixture of 2,2-bis-(4-(2-hydroxy-3-methacryloyloxypropoxy)phenyl)propane (“Bis-GMA”) and multifunctional prepolymer formed by substituting hydrogen atoms in hydroxyl group with methacrylate groups in this Bis-GMA molecules, and ii) comprising a diluent, an inorganic filler, a photoinitiation system, and other additives. The photopolymerizable composite resin composition for dental restoration based on multifunctional prepolymer mixture has better physical and mechanical properties and biocompatibility than the conventional composition based on only Bis-GMA itself.
    Type: Grant
    Filed: October 30, 2000
    Date of Patent: January 15, 2002
    Assignee: Dentkist Co., Ltd.
    Inventors: Dong-Keun Han, Kwang-Duk Ahn, Jong-Man Kim, Jin-Hee Jeong