Abstract: The improved ion source of the present invention includes upper and lower spaced apart but coaxially arranged magnetic pole rings having differing inner diameters. Because of the non-symmetry of the pole pieces or rings, the magnetic flux field created therebetween is non-symmetrical from top to bottom. This, and the arrangement and configuration of the anode ring located between the pole pieces, create an increased plasma region and higher plasma density resulting in increased thermal management, improved stoichiometry and increased density of the thin film devices being fabricated.

Abstract: The present arrangement includes a plurality of support members each having a slot therein and wherein each slot is substantially equal to the thickness of a viewing member (an overlay piece). The viewing member is formed to not reflect light, that is to have a light anti-relection characteristic and is disposed between a viewer and the item to be viewed. The support members are slipped slotwise over the edges of the overlay piece and provide supports to hold the overlay piece on the item to be viewed and permit removable therefrom without interfering with the view of the item to be viewed. In one embodiment the overlay member is movably mounted through the support members.

Abstract: The present apparatus includes a rotating table which is loaded with removable carriers, each of which holds a substrate to be coated. The carriers are advanced to a loading position and are pushed from the table thereat into a hollow cylinder. Each carrier has a pair of O-rings on its periphery which are squeezed against the inside surface of the cylinder to effect a double seal. Each carrier pushes the carrier ahead of it up through the cylinder in a train like fashion. Along the cylinder there are vacuum stations which act to pump down and degas the substrates. Apertures are provided in the vacuum stations and these apertures are formed to permit the O-rings to expand as the carriers pass by the apertures without causing the O-rings to be cut or scored. Within a vacuum chamber there is included a vapor trap which helps remove water vapor from the substrates during the degassing operation.

Abstract: The present apparatus has a movable table with apertures therein. In each aperture there is loaded a carrier device and each carrier holds a substrate to be coated. The carriers are advanced in a step-like fashion to a loading position under a vertical hollow cylinder. When a carrier is in the loading position, a piston is moved upward, passing through the aperture, pushing the carrier into the hollow cylinder. Each carrier has an O-ring on its periphery and the O-ring is squeezed against the cylinder wall to form a seal. Each carrier pushes against the one above it to advance a column of carriers upward in the hollow cylinder. In this way, the carriers, and the substrates they hold, pass through the hollow cylinder. Along the cylinder there are vacuum stations which act to pump down and degas the substrates. The degassed substrates eventually emerge from the upper end of the cylinder into a vacuum chamber, whereat they are coated by sputtering, or the like.

Abstract: In the present device the lower section is an external plasma gun which acts as a source of ionized gas. The upper section of the device is a magnetron which has a plasma chamber and which includes both a source of magnetic flux as well as the apparatus necessary to generate an electrostatic field so that within the plasma chamber of the magnetron there are EXB forces. The magnetron is supported in close proximity to, and is electrically insulated from, the external plasma gun. The above arrangement permits the magnetron to produce and maintain a plasma phenomenon with a very low pressure of gas (of the order of one millitorr to two tenths of a millitorr) in the vacuum chamber.

Abstract: The present device comprises, in a preferred embodiment, a permanent magnet assembly which is formed to closely resemble a doughnut with the inside surface defining an aperture having first and second ends. Said inside surface is formed concave to substantially resemble the letter "C", or a mirror image letter "C". The permanent magnet provides magnetic flux from one end of the "C" to the other and hence the magnetic flux lines, or the magnetic flux field, form, in conjunction with the concave letter "C" configuration of the permanent magnet, an enclosure. Within the enclosure there is located an anode, and the anode is shielded from electrons by the magnetic flux field. In one embodiment, in close proximity to the second end of said aperture of the permanent magnet piece there is located a cathode, while at said first end of the aperture there is located a screen. In another embodiment, which is used for sputtering, there is no screen employed.

Abstract: The present device comprises, in a preferred embodiment, a permanent magnet assembly which is formed to closely resemble a doughnut with the inside surface defining an aperture having first and second ends. Said inside surface is formed concave to substantially resemble the letter "C." The permanent magnet provides magnetic flux from one end of the "C" shaped inside surface to the other end. Hence the magnetic flux lines, or the magnetic flux field, form an enclosure with the concave configuration of the inside surface. An anode is located within the enclosure and is shielded by the magnetic flux field, i.e., the magnetic flux impedes the electrons from directly striking the anode. A cathode means is fitted over said first end of the aperture of the permanent magnetic assembly. A plasma exit plate, having a substantially large aperture therein, is fitted over said second end of the aperture of the permanent magnetic assembly.

Abstract: The present invention provides, in a preferred embodiment, a cylindrical stainless steel cathode with end pieces thereon to form a cathode chamber within. In addition, in a preferred embodiment, there is a stainless steel rod which passes axially through the cathode chamber and which is electrically insulated therefrom at the end pieces. The stainless steel cathode has first and second apertures formed therein with the first to be connected to a source of ionizable gas and the second to act as the opening through which there passes a stream of ions to an ion beam target. A magnetic flux source is coupled to the cathode chamber to pass magnetic flux therethrough and a voltage source is connected between the anode and the cathode to provide an electrostatic field therebetween whereby when ionizable gas is fed into the cathode chamber, it is ionized and a stream of ions emanates from the second aperture.

Abstract: The present invention provides, in a sputtering apparatus, an anode means interposed between the cathode and the substrate (upon which material is to be deposited) which acts to intercept electrons so that they do not impinge on the substrate and which is formed to permit the material dislodged from the cathode (by impinging ions) to pass beyond the anode and be deposited on the substrate. While the present invention can be usefully employed without the aid of a magnetic field, in a preferred embodiment, the present invention is made part of a planar magnetron.