Abstract: The present disclosure relates to a substrate treatment apparatus including: a substrate-holding unit for holding and rotating a substrate; a treatment liquid feed unit for feeding treatment liquid to a top or underside of the substrate; a substrate heater located under the substrate and having a plurality of LEDs mounted thereon; and a blocking plate located on the substrate-holding unit, wherein a portion in a circumferential direction of the substrate heater about the center of the substrate is an unequally distributed LED portion where the LEDs have differential densities in a radial direction of the substrate and the remaining portion in the circumferential direction is an equally distributed LED portion where the LEDs are equally distributed in the radial direction of the substrate.

Abstract: The present disclosure relates to a substrate treatment apparatus including: a substrate treatment apparatus including: a chuck base rotating together with a substrate in a state of supporting the substrate thereagainst; a fluid supply unit for supplying treatment liquid to the substrate; a bowl assembly having a plurality of bowls that overlap outward in a radial direction with respect to the center of the substrate in such a way as to surround the chuck base; an ascending and descending unit for moving the bowl assembly up and down; and a shutter unit disposed on top of the outermost bowl of the bowl assembly to adjust a radius of an air flow inlet through which air flow passes toward the substrate.

Abstract: The present disclosure relates to a substrate treatment apparatus including: a substrate-holding unit for holding and rotating a substrate; a treatment liquid feed unit for feeding treatment liquid to a top or underside of the substrate; a heating unit located under the substrate to heat the substrate; a blocking plate located on the substrate-holding unit above the heating unit; upper sensors located above the blocking plate to constitute one of a light transmitter and a light receiver; and lower sensors located under the blocking plate to constitute the other, wherein a quantity of light irradiated from the light transmitter and thus reaching the light receiver is measured to allow the light transmittance of the blocking plate to be obtained.

Abstract: The present disclosure relates to a substrate treatment apparatus including: a substrate-holding unit for holding and rotating a substrate; a treatment liquid feed unit for feeding treatment liquid to a top of the substrate; a rinsing liquid feed unit for feeding rinsing liquid to the top of the substrate; a drying liquid feed unit located to reciprocate horizontally above the substrate in such a way as to feed drying liquid to a drying liquid injection nozzle, in a state where the entire top region of the substrate is covered with the rinsing liquid, to allow the rinsing liquid to be replaced with the drying liquid; and a heating unit located under the substrate to heat the substrate.

Abstract: The present disclosure relates to a substrate treatment apparatus having a heating part, including: a chuck base disposed rotatable around a rotational axis and having a ring-shaped spin chuck with chuck pins to support a substrate and a chuck support part located on lower portion of the inner peripheral surface of the spin chuck; a back nozzle assembly mounted at the center of the chuck base; cover glass disposed between top of the spin chuck and the back nozzle assembly; and a heating part disposed between the cover glass and the chuck support part, wherein slant refracting surface is formed on a central portion of the cover glass and slants upward in a radial direction with respect to the rotational axis.

Abstract: The present disclosure relates to a substrate treatment apparatus including: a chuck base connected to a driving shaft in such a way as to be rotatable together with the driving shaft and having a spin chuck with chuck pins disposed on top thereof to support a substrate and a chuck support part; a fluid supply unit for supplying treatment liquid to an upper surface of the substrate; a back nozzle assembly mounted through a hollow portion formed at the center of the chuck base to spray treatment liquid onto a lower surface of the substrate; cover glass disposed between the spin chuck and the back nozzle assembly; a heating part disposed between the spin chuck and the back nozzle assembly in a space between the cover glass and the chuck support part; and a heat sink contacting a lower surface of the heating part.

Abstract: The present disclosure relates to a substrate treatment apparatus including: a chuck base having a ring-shaped spin chuck with chuck pins disposed on top thereof to support a substrate and a chuck support part located on the lower portion of the inner peripheral surface of the spin chuck; a back nozzle assembly mounted through a hollow portion formed at the center of the chuck base to spray treatment liquid onto a lower surface of the substrate; cover glass disposed between top of the spin chuck and the back nozzle assembly; and a heating part located inside the inner peripheral surface of the spin chuck in a space between the cover glass and the chuck support part, wherein the spin chuck is separably coupled to the chuck support part in an up-down direction.

Abstract: The present invention relates to a substrate edge etching apparatus including: a substrate support assembly having a horizontally rotatable chuck base, chuck pins disposed on top of the chuck base to support a substrate, a purge gas inlet hole extending from an underside center of the chuck base to an interior of the chuck base in an upward and downward direction thereof, and a purge gas outlet hole extending radially from the purge gas inlet hole and then extending upwardly to penetrate top of the chuck base; a purge gas supply assembly for supplying a purge gas to the purge gas inlet hole; a chemical liquid supply unit for supplying a chemical liquid to top of the substrate; a bowl assembly having bowls surrounding the periphery of the substrate support assembly and configured to be able to ascend and descend; and a fan filter unit spaced apart from top of the substrate support assembly.

Abstract: Provided is an intake-exhaust unit that easily controls the flow of air in an intermediate cavity of a double skin structure window glass, and a double skin system using the same.

Abstract: An inner glass skin structure is configured by a sashless plate glass that overcomes the difference in the coefficients of linear expansion and insufficient rigidity of aluminum and glass having a superior design, in which the four sides of each of the sashless plate glass are covered by an aluminum covering material having narrow width. The inner glass skin structure is configured by a plurality of sashless plate glasses four sides of which are covered with an aluminum covering material, a door roller and a securing foot member respectively fixed on the bottom of each plate glass on the movable side and immovable side of the plate glass of the sliding door formation, and a lower rail member arranged underneath the plate glass and an upper rail member arranged directly above each plate glass.