Abstract: A gas supply apparatus with improved control is provided. The gas supply apparatus provides gas at an outlet junction. The apparatus includes a gas mixer for gasses from primary and secondary supplies to a given ratio. The apparatus also includes a gas reservoir supplied by the gas mixer. A tertiary supply valve is also included and connected in parallel with the reservoir. The tertiary supply valve is adapted to connect the outlet junction to a tertiary gas supply when gas is not being supplied to a mixer by the primary and/or secondary supply.
Type:
Grant
Filed:
January 24, 2007
Date of Patent:
March 24, 2020
Assignee:
DEVX Tech IP Limited
Inventors:
Andrew Michael Chapman, Bruce William Potter
Abstract: A gas supply apparatus with improved control is provided. The gas supply apparatus provides gas at an outlet junction. The apparatus includes a gas mixer for gasses from primary and secondary supplies to a given ratio. The apparatus also includes a gas reservoir supplied by the gas mixer. A tertiary supply valve is also included and connected in parallel with the reservoir. The tertiary supply valve is adapted to connect the outlet junction to a tertiary gas supply when gas is not being supplied to a mixer by the primary and/or secondary supply.
Type:
Application
Filed:
January 24, 2007
Publication date:
November 25, 2010
Applicant:
DEVX TECH IP LIMITED [NZ/NZ]
Inventors:
Andrew Michael Chapman, Bruce William Potter
Abstract: A fluid mixing apparatus is provided. The apparatus has a mixing volume, a primary inlet, secondary inlet, and an outlet are provided for the volume. The secondary inlet includes a valve which is adapted to be operated by a driver to pulse width modulate the valve between two flow states to achieve a given flow state through the secondary inlet.
Type:
Application
Filed:
January 24, 2007
Publication date:
November 11, 2010
Applicant:
DEVX TECH IP LIMITED [NZ/NZ]
Inventors:
Andrew Michael Chapman, Bruce William Potter