Patents Assigned to Diodes Fabtech Inc
  • Patent number: 7709864
    Abstract: A rectifier device (10) comprising a multi-layer epitaxial film (12) and a rectifier and a transistor manufactured in the film (12), wherein the transistor is oriented vertically relative to the plane of the rectifier. The rectifier and transistor are separated by a transition zone of inverted bias. The rectifier is a Schottky barrier rectifier, and the transistor is a JFET. More specifically, the device (1) comprises the film (12), a trench (16), a first region (18) associated with an upper portion of the trench (16), and second region (20) associated with a lower portion. The interface between the p+ material of the second region (20) and the n material of the film (12) creates a p+/n junction. The device (10) has use in high frequency, low-loss power circuit applications in which high switching speed and low forward voltage drop are desirable.
    Type: Grant
    Filed: April 7, 2006
    Date of Patent: May 4, 2010
    Assignee: Diodes Fabtech Inc
    Inventors: Roman Hamerski, Chris Hruska, Fazia Hossain