Patents Assigned to Director General of Agency of Industrial Science and Technology Michio Kawata
  • Patent number: 4496450
    Abstract: A multicomponent amorphous silicon film suitable for a solar cell is produced at a higher deposition rate by a novel process comprising using jointly a sputtering method and a plasma CVD method within a pressure range of not lower than a pressure at which the maximum film formation rate is given in the sputtering method.
    Type: Grant
    Filed: March 29, 1984
    Date of Patent: January 29, 1985
    Assignee: Director General of Agency of Industrial Science and Technology Michio Kawata
    Inventors: Hajime Hitotsuyanagi, Nobuhiko Fujita, Hideo Itozaki, Hiromu Kawai