Abstract: An organic material purification composition, a mixed composition, and a method of purifying an organic material, the organic material purification composition including an ionic liquid in which a cation and an anion are combined; and an organic solvent, wherein the organic solvent includes an alcohol or a ketone.

Abstract: An apparatus for feeding a solar panel includes a picker section which holds a plurality of solar panels; a first feeding section which makes the picker section reciprocate in a vertical direction; and a second feeding section which makes the picker section reciprocate in a horizontal direction, wherein the picker section includes: a main rail arranged in the horizontal direction; a plurality of picker units provided under the main rail, reciprocating in a lengthwise direction of the main rail, and holding and moving corresponding solar panels at a time; a connecting unit connecting neighboring picker units among the picker units, and restricting a space between the neighboring picker units not to go beyond a preset reference space; and an adjusting unit provided on the main rail to make the picker units move in the lengthwise direction of the main rail and adjust a space between the picker units.

Abstract: Disclosed is an apparatus for cutting a solar panel, which includes a power generating section which generates power; a base section provided which is placed under the solar panel, a negative-pressure generating section which is placed under the stationary plate and the respective rotary plates, a power splitting section which receives the power from the power generating section and splits the power into rotary power in different directions; and a power transmitting section which divisionally transmits the rotary power in different directions to the first rotary section and the second rotary section.

Abstract: An apparatus for treating a substrate including a plurality of transfer rollers configured to transfer a substrate and simultaneously to be rotated to wet a back surface of the substrate; a plurality of chemical solution supply tanks configured to receive the chemical solution therein, the plurality of the chemical solution supply tanks arranged under the plurality of the transfer rollers, respectively, with being spaced apart a predetermined distance from each other; a main tank configured to surround the plurality of the chemical solution supply tanks; and an exhaustion unit configured to suck and exhaust fume generated in the process of wetting the back surface with the chemical solution and liquid drops of the chemical solution.

Abstract: An apparatus for chemical vapor deposition is disclosed. An aspect of the present invention provides an apparatus for chemical vapor deposition that includes: a process chamber configured to demarcate a reaction space; a back plate placed above the reaction space and having a gas inlet in a middle thereof; a gas diffusion member arranged below and separated from the gas inlet and coupled to the back plate by a first coupling member and configured to diffuse process gas supplied through the gas inlet; a shower head placed below and separated from the back plate and the gas diffusion member and having a middle part thereof coupled to the gas diffusion member by a second coupling member and having a plurality of spray holes perforated therein; and a susceptor arranged below and separated from the shower head and supporting a substrate.

Abstract: A plasma chemical reactor includes a chamber for providing a plasma reaction space, and a cathode assembly coupled at one side to a wall surface of the chamber and supporting a substrate at the other side such that the substrate is positioned at a center inside the chamber, and installed to enable height adjustment such that the substrate can maintain a horizontal state.

Abstract: A side gas injector for a plasma reaction chamber is provided. The side gas injector includes a circular distribution plate and a cover plate. The circular distribution plate includes an injection hole for injecting a reaction gas and a distribution channel part for distributing the reaction gas such that the reaction gas introduced from the injection hole can be radially simultaneously jetted in a plurality of positions along an inner circumference surface of the distribution plate. The cover plate is coupled to a top of the distribution plate and seals a top of the distribution channel part.

Abstract: A workpiece de-chucking device of a plasma reactor for dry-cleaning the inside of a reaction chamber and an ElectroStatic chuck (ESC) during workpiece de-chucking and a workpiece de-chucking method using the same are provided. The workpiece de-chucking device includes a lifting unit, an ICP source power unit, and a controller. The lifting unit lifts a workpiece mounted on a top surface of an ESC. The ICP source power unit forms a magnetic field in an inductive coil arranged outside a dielectric window. The controller outputs a source power control signal, a lift control signal, and a de-chucking control signal.

Abstract: Embodiments of the present invention relates to an apparatus for treating a substrate, more particularly, to an apparatus for treating a substrate that is able to perform treating with respect to a predetermined surface of a substrate and to reduce usage of solution for the surface treating of the substrate.

Abstract: A plasma reactor and an etching method using the same are provided. The method includes a first changing step of changing the number or arrangement structure of inductive coils connecting to an RF source power supply unit, a step of applying RF source power and generating high density plasma, a first etching step of etching a first etch-target layer of a workpiece, a first stopping step of stopping applying the RF source power, a second changing step of changing the number or arrangement structure of the inductive coils, a step of applying RF source power to corresponding inductive coils and generating low density plasma, a second etching step of etching a second etch-target layer of the workpiece, and a second stopping step of stopping applying the RF source power.

Abstract: A wind power generator includes a pillar fixed on a base, a nacelle platform disposed on an upper end portion of the pillar, a service crane provided at a side of the nacelle platform, a generator assembly coupled to the nacelle platform, a rotor hub rotatably coupled to the generator assembly, and a plurality of blades coupled to the rotor hub and rotating the rotor hub. The rotor hub is provided at an outer circumference of a front end thereof with a plurality of first pulleys for guiding a case from a winch installed on the ground.

Abstract: An apparatus and method for producing a dye-sensitized cell are provided, in which a pre-transparent electrode and an opposite electrode are partially bonded, dye molecules are applied to the bonded electrodes followed by washing, an electrolyte is injected, and then the electrodes are hermetically sealed. With the apparatus and method, the manufacturing cost can be reduced and the manufacturing process can be simplified.

Abstract: An endpoint detection device, a plasma reactor with the endpoint detection device, and an endpoint detection method are provided. The endpoint detection device includes an OES data operation unit, a data selector, a product generator, an SVM, and an endpoint determiner. The OES data operation unit processes reference OES data by normalization and PCA. The data selector selects part of the linear reference loading vectors and selects part of the selected linear reference loading vectors. The product generator outputs at least one reference product value. The SVM performs regression and outputs a prediction product value. The endpoint determiner detects a process wafer etch or deposition endpoint and outputs a detection signal.

Abstract: An apparatus and method for producing a dye-sensitized cell are provided, in which a pre-transparent electrode and an opposite electrode are partially bonded, dye molecules are applied to the bonded electrodes followed by washing, an electrolyte is injected, and then the electrodes are hermetically sealed. With the apparatus and method, the manufacturing cost can be reduced and the manufacturing process can be simplified.

Abstract: A plasma chemical reactor is provided. The reactor includes a chamber, a cathode assembly, and a baffle plate. The chamber forms a plasma reaction space. The cathode assembly includes a cathode support shaft and a substrate support. The cathode support shaft is coupled at one side to a wall surface of the chamber. The substrate support is coupled to the other side of the cathode support shaft and supports the substrate. The baffle plate is out inserted and coupled to the substrate support, and has a plurality of vents arranged to be spaced apart and through formed such that reaction gas can pass through, and the vents asymmetrically arranged and formed to get a vent area smaller at an opposite side than a top side of the cathode support shaft.

Abstract: A plasma reactor includes a chamber in which a wafer is treated by a plasma reaction, the chamber being provided at an upper portion with a cylindrical dielectric window, a multiple antenna structure disposed on upper and lower portions of the dielectric window to generate RF magnetic field and apply the RF magnetic field inside the chamber through the dielectric window, thereby generating RF electric field, and an RF electric power supply unit for allowing for a time variation of the magnetic field of the multiple antenna structure.

Abstract: An endpoint detection device, a plasma reactor with the endpoint detection device, and an endpoint detection method are provided. The endpoint detection device includes an OES data operation unit, a data selector, a product generator, an SVM, and an endpoint determiner. The OES data operation unit processes reference OES data by normalization and PCA. The data selector selects part of the linear reference loading vectors and selects part of the selected linear reference loading vectors. The product generator outputs at least one reference product value. The SVM performs regression and outputs a prediction product value. The endpoint determiner detects a process wafer etch or deposition endpoint and outputs a detection signal.

Abstract: An endpoint detection device, a plasma reactor with the endpoint detection device, and an endpoint detection method are provided. The endpoint detection device includes an OES data operation unit, a data selector, a product generator, an SVM, and an endpoint determiner. The OES data operation unit processes reference OES data by normalization and PCA. The data selector selects part of the linear reference loading vectors and selects part of the selected linear reference loading vectors. The product generator outputs at least one reference product value. The SVM performs regression and outputs a prediction product value. The endpoint determiner detects a process wafer etch or deposition endpoint and outputs a detection signal.

Abstract: An apparatus and method for producing a dye-sensitized cell are provided, in which a pre-transparent electrode and an opposite electrode are partially bonded, dye molecules are applied to the bonded electrodes followed by washing, an electrolyte is injected, and then the electrodes are hermetically sealed. With the apparatus and method, the manufacturing cost can be reduced and the manufacturing process can be simplified.

Abstract: A slurry composition for forming a layer is provided. The slurry composition includes 100 parts by weight of a metal oxide selected from the group consisting of MgO, CaO, SrO, BaO, ZrO3, and a combination thereof; 1-200 parts by weight of a binding agent per 100 parts by weight of the metal oxide, the binding agent being selected from the group consisting of calcium phosphate (CaP), a calcium-barium-boron-based (CBB-based) oxide, a triple carbonate ((Ca, Ba, Sr)CO3), and a combination thereof; 1-10 parts by weight of a binder per 100 parts by weight of the metal oxide, the binder being selected from the group consisting of nitro cellulose, ethyl cellulose, methyl methacrylate, and a combination thereof; and 50-500 parts by weight of a solvent per 100 parts by weight of the metal oxide.