Publication number: 20160176835
Abstract: A continuous process for the preparation of propylene oxide, comprising (i) providing a liquid feed stream comprising propene, hydrogen peroxide, acetonitrile, water, optionally propane, and at least one dissolved potassium salt; (ii) passing the feed stream provided in (i) into an epoxidation reactor comprising a catalyst comprising a titanium zeolite of structure type MWW, and subjecting the feed stream to epoxidation reaction conditions in the epoxidation reactor, obtaining a reaction mixture comprising propylene oxide, acetonitrile, water, the at least one potassium salt, optionally propene, and optionally pane; (iii) removing an effluent stream from the epoxidation reactor, the effluent stream comprising propylene oxide, acetonitrile, water, at least a portion of the at least one potassium salt, optionally propene, and optionally propane.
Type:
Application
Filed:
July 16, 2014
Publication date:
June 23, 2016
Applicants:
BASF SE, DOW Global Technologies LLC
Inventors:
Dominic RIEDEL, Joaquim Henrique TELES, Ulrike WEGERLE, Andrei-Nicolae PARVULESCU, Alexander SCHROEDER, Luise SPISKE, Daniel URBANCZYK, Ulrich MUELLER, Werner WITZL, Meinolf Weidenbach
Patent number: 9366964
Abstract: A composition comprising: A) polymer that comprises: L is CX—CYZ, where X, Y, and Z are independently hydrogen, an alkyl, or a substituted alkyl; and, M is an alkylene, an arylene, a substituted alkylene, a substituted arylene, or C(O)O—W—, where W is an alkylene or a substituted alkylene; and R?, R?, and R?? are independently selected from an aromatic hydrocarbon, an aliphatic hydrocarbon, or a substituted hydrocarbon that comprises one or more of O, N, S, or Si atoms, provided that at least one of R?, R?, and R?? is selected from alkoxyl, aryloxyl, hydroxyl, halide, carboxyl, or carbonate; and, p is from 1 to 10,000; and the polymer does not comprise a polyhedral oligomeric silsesquioxane structure; and B) a polymer formed from a composition comprising at least one Si-containing compound as described herein. Compositions are suitable for microelectronic applications, and have improved adhesion to photoresists polymers.
Type:
Grant
Filed:
August 28, 2012
Date of Patent:
June 14, 2016
Assignees:
Dow Global Technologies LLC, Rohm and Haas Electronic Materials LLC
Inventors:
Yuanqiao Rao, Robert L. Auger, Cecilia W. Kiarie, Yasmin N. Srivastava, Christopher P. Sullivan