Abstract: A lubricant composition comprising a Group I, II, III or IV hydrocarbon oil and a polyalkylene glycol, the polyalkylene glycol having been prepared by reacting a C8-C20 alcohol and a mixed butylene oxide/propylene oxide feed using a double metal cyanide catalyst catalyzed oxyalkylation process, and wherein the lubricant composition remains clear and shows no phase separation at temperatures equal to and greater than the pour point of the hydrocarbon oil is provided. A method for making a lubricant composition is also provided.
Type:
Application
Filed:
September 14, 2012
Publication date:
September 4, 2014
Applicant:
Dow Global Technologies LLC
Inventors:
Martin R. Greaves, Ronald Van Voorst, Marinus Meertens
Abstract: A process for making a phosphorus-containing compound is disclosed. The process comprises contacting a compound of formula (A) wherein RA and RB are selected from optionally substituted aryl, aryloxy, alkyl and alkoxy groups or can be combined to form cyclic structures; and RC is methyl, ethyl, isopropyl, n-butyl, i-butyl, t-butyl, phenyl or benzyl; and a compound of formula (B) wherein R1-R4 are selected from optionally substituted aryl, aryloxy, alkyl and alkoxy groups. The phosphorus-containing compound can then be used as a flame retardants for polymers, especially for epoxy, polyurethane, thermosetting resins and thermoplastic polymers. Such flame retardant-containing polymers can be used to make protective coating formulations and ignition-resistant fabricated articles, such as electrical laminates, polyurethane foams, and various molded and/or foamed thermoplastic products.
Abstract: The instant invention provides nonwoven fabrics and staple or binder fibres prepared from an ethylene-based polymer having a Comonomer Distribution Constant in the range of from greater than from 100 to 400, a vinyl unsaturation of less than 0.1 vinyls per one thousand carbon atoms present in the backbone of the ethylene-based polymer composition; a zero shear viscosity ratio (ZSVR) in the range from 1 to less than 2; a density in the range of 0.930 to 0. 970 g/cm3, a melt index (12) in the range of from 15 to 30 or from 10 to 50 g/10 minutes, a molecular weight distribution (Mw/Mn) in the range of from 2 to 3.5, and a molecular weight distribution (Mz/Mw) in the range of from less than 2.
Type:
Application
Filed:
October 4, 2012
Publication date:
September 4, 2014
Applicant:
Dow Global Technologies LLC
Inventors:
Jacquelyn A. Degroot, Gert J. Claasen, Selim Bensason, Mehmet Demirors, Thor Gudmundsson, Jason C. Brodil
Abstract: A composition for use in forming a multi-block copolymer, said copolymer containing therein two or more segments or blocks differing in chemical or physical properties, a polymerization process using the same, and the resulting polymers, wherein the composition comprises the admixture or reaction product resulting from combining: (A) a first metal complex olefin polymerization catalyst, (B) a second metal complex olefin polymerization catalyst capable of preparing polymers differing in chemical or physical properties from the polymer prepared by catalyst (A) under equivalent polymerization conditions, and (C) a chain shuttling agent.
Type:
Application
Filed:
May 15, 2014
Publication date:
September 4, 2014
Applicant:
Dow Global Technologies LLC
Inventors:
Daniel J. Arriola, Edmund M. Carnahan, Yunwa Wilson Cheung, David D. Devore, David D. Graf, Phillip D. Hustad, Roger L. Kuhlman, Colin Li Pi Shan, Benjamin C. Poon, Gordon R. Roof, James C. Stevens, Pamela J. Stirn, Timothy T. Wenzel
Abstract: The present disclosure is directed to a single phase acetylated castor component (SP-ACC). An acetylated castor component is purified to produce the SP-ACC which contains a reduced amount of, or no, insoluble component(s) therein. The SP-ACC enhances the performance and properties of plasticizers of which it is a component.
Type:
Grant
Filed:
September 6, 2013
Date of Patent:
September 2, 2014
Assignee:
Dow Global Technologies LLC
Inventors:
Bharat I. Chaudhary, Beate Sczekalla, Abhijit Ghosh-Dastidar, Yang Cheng, Prashant Tatake, Raymond M. Collins
Abstract: A copolymer composition is provided including a block copolymer having a poly(styrene) block and a poly(silyl acrylate) block; wherein the block copolymer exhibits a number average molecular weight, MN, of 1 to 1,000 kg/mol; and, wherein the block copolymer exhibits a polydispersity, PD, of 1 to 2. Also provided are substrates treated with the copolymer composition.
Type:
Grant
Filed:
February 8, 2013
Date of Patent:
September 2, 2014
Assignees:
Rohm and Haas Electronic Materials LLC, Dow Global Technologies LLC
Inventors:
Peter Trefonas, Phillip Hustad, Xinyu Gu, Erin Vogel, Valeriy Ginzburg, Shih-Wei Chang, Daniel Murray
Abstract: A method for processing a substrate is provided; wherein the method comprises applying a film of a copolymer composition, comprising a poly(styrene)-b-poly(siloxane) block copolymer component; and, an antioxidant to a surface of the substrate; optionally, baking the film; subjecting the film to a high temperature annealing process under a gaseous atmosphere for a specified period of time; followed by a treatment of the annealed film to remove the poly(styrene) from the annealed film and to convert the poly(siloxane) in the annealed film to SiOx.
Type:
Grant
Filed:
July 12, 2012
Date of Patent:
September 2, 2014
Assignees:
Rohm and Haas Electronic Materials LLC, Dow Global Technologies LLC
Inventors:
Xinyu Gu, Shih-Wei Chang, Phillip D. Hustad, Jeffrey D. Weinhold, Peter Trefonas
Abstract: A method of forming a pattern comprises diffusing an acid, generated by irradiating a portion of a photosensitive layer, into an underlayer comprising an acid sensitive copolymer comprising an acid decomposable group and an attachment group, to form an interpolymer crosslink and/or covalently bonded to the surface of the substrate. Diffusing comprises heating the underlayer and photosensitive layer. The acid sensitive group reacts with the diffused acid to form a polar region at the surface, in the shape of the pattern. The photosensitive layer is removed to forming a self-assembling layer comprising a block copolymer having a block with an affinity for the polar region, and a block having less affinity than the first. The first block forms a domain aligned to the polar region, and the second block forms a domain aligned to the first. Removing either the first or second domain exposes a portion of the underlayer.
Type:
Grant
Filed:
October 4, 2011
Date of Patent:
September 2, 2014
Assignees:
Rohm and Haas Electronic Materials LLC, Dow Global Technologies LLC
Inventors:
Peter Trefonas, Phillip Dene Hustad, Cynthia Pierre
Abstract: A method for processing a substrate is provided; wherein the method comprises applying a film of a copolymer composition, comprising a poly(styrene)-b-poly(siloxane) block copolymer component; and, an antioxidant to a surface of the substrate; optionally, baking the film; annealing the film in a gaseous atmosphere containing ?20 wt % oxygen; followed by a treatment of the annealed film to remove the poly(styrene) from the annealed film and to convert the poly(siloxane) in the annealed film to SiOx.
Type:
Grant
Filed:
July 12, 2012
Date of Patent:
September 2, 2014
Assignees:
Rohm and Haas Electronic Materials LLC, Dow Global Technologies LLC
Inventors:
Phillip D. Hustad, Xinyu Gu, Shih-Wei Chang, Jeffrey D. Weinhold, Peter Trefonas
Abstract: Embodiment of the invention provide for compositions having at least one crosslinkable silyl group in each molecule. The crosslinkable silane-terminated polymer may include a reaction product of at least a polyol having a nominal functionality of at least 2 and a isocyanate capped hydrosilylated polymer. The isocyanate capped hydrosilylated polymer may include a reaction product of at least one isocyanate and a hydrosilylated polymer. The hydrosilylated polymer may include a reaction product of a the reaction of at least a) a polymer having at least one unsaturated group and at least one alcoholic hydroxyl group in each molecule and having a number average molecular weight of between about 100 and about 5000 and b) a compound having a hydrogen-silicon bond and a crosslinkable silyl group in each molecule.
Type:
Grant
Filed:
June 29, 2011
Date of Patent:
September 2, 2014
Assignee:
Dow Global Technologies LLC
Inventors:
Ling Zhang, Kamesh R. Vyakaranam, Sara Arshad, William A. Koonce
Abstract: Embodiments of the invention provide for compositions including a crosslinkable silane-terminated polymer having at least one crosslinkable silyl group in each molecule. The crosslinkable silane-terminated polymer comprises a reaction product of at least a isocyanate capped hydrosilylated polymer and a polyol having a nominal functionality of at least 2 which is at least one of a polycarbonate polyol, a natural oil based polyol, a polyoxyalkyleneamine, a difunctional aromatic amine, a polybutyloxide polyether polyol, and a polytetramethylene glycol.
Type:
Grant
Filed:
June 28, 2011
Date of Patent:
September 2, 2014
Assignee:
Dow Global Technologies LLC
Inventors:
Kameswara R. Vyakaranam, Ling Zhang, William A. Koonce, Sara Arshad, Venkat S. Minnikanti, Dwight D. Latham, Phillip S. Athey
Abstract: A block copolymer formulation is provided including a block copolymer blend including a first poly(acrylate)-b-poly(silyl acrylate) block copolymer; and, a second poly(acrylate)-b-poly(silyl acrylate) block copolymer. Also provided are substrates treated with the block copolymer formulation.
Type:
Grant
Filed:
February 8, 2013
Date of Patent:
September 2, 2014
Assignees:
Rohm and Haas Electronic Materials LLC, Dow Global Technologies LLC
Inventors:
Phillip Hustad, Peter Trefonas, Xinyu Gu, Shih-Wei Chang, Valeriy Ginzburg, Erin Vogel, Daniel Murray
Abstract: Embodiments of the invention provide crystalline block composites and their use as compatibilizers. The crystalline block composites comprise i) a crystalline ethylene based polymer; ii) a crystalline alpha-olefin based polymer and iii) a block copolymer comprising a crystalline ethylene block and a crystalline alpha-olefin block.
Type:
Grant
Filed:
June 21, 2011
Date of Patent:
September 2, 2014
Assignee:
Dow Global Technologies LLC
Inventors:
Colin Li Pi Shan, Kim L. Walton, Gary R. Marchand, Edmund M. Carnahan, Thomas Karjala
Abstract: The invention provides an ethylene-based polymer comprising the following properties: A) a MWDconv from 7 to 10; and B) a “normalized LSF” greater than, or equal to, 9.5.
Type:
Grant
Filed:
December 2, 2011
Date of Patent:
September 2, 2014
Assignee:
Dow Global Technologies LLC
Inventors:
Teresa P. Karjala, Lori L. Kardos, Wallace W. Yau, Jose Ortega
Abstract: A copolymer composition is provided including a block copolymer having a poly(acrylate) block and a poly(silyl acrylate) block; wherein the block copolymer exhibits a number average molecular weight, MN, of 1 to 1,000 kg/mol; and, wherein the block copolymer exhibits a polydispersity, PD, of 1 to 2. Also provided are substrates treated with the copolymer composition.
Type:
Grant
Filed:
February 8, 2013
Date of Patent:
September 2, 2014
Assignees:
Rohm and Haas Electronic Materials LLC, Dow Global Technologies LLC
Inventors:
Peter Trefonas, Phillip Hustad, Xinyu Gu, Erin Vogel, Valeriy Ginzburg, Shih-Wei Chang, Daniel Murray
Abstract: A method of forming a pattern comprises diffusing an acid formed by irradiating a portion of a photosensitive layer, into an underlayer comprising an acid sensitive copolymer having acid decomposable groups and attachment groups covalently bonded to the surface of the substrate and/or forming an interpolymer crosslink. Diffusing comprises heating the underlayer and photosensitive layer. The acid sensitive group reacts with the diffused acid to form a polar region on the underlayer, with the shape of the pattern. The photosensitive layer is removed, forming a self-assembling layer comprising a block copolymer having a first block with an affinity for the polar region, and a second block having less affinity for the polar region. The first block forms a domain aligned to the polar region, and the second block forms another domain aligned to the first. Removing either domain exposes a portion of the underlayer.
Type:
Grant
Filed:
October 4, 2011
Date of Patent:
September 2, 2014
Assignee:
Dow Global Technologies LLC
Inventors:
Peter Trefonas, Phillip Dene Hustad, Cynthia Pierre
Abstract: Polystyrene is dispersed into a polyol via a mechanical dispersion process. A stabilizer is present to stabilize the dispersed polymer particles. The stabilizer includes a copolymer of (1) from 10 to 70% by weight of a branched polyol which has a molecular weight of from 4000 to 20,000, from 0.2 to about 1.2 polymerizable ethylenically unsaturated groups per molecule and from about 3 to about 8 hydroxyl groups per molecule with (2) from 30 to 90% by weight of styrene or a mixture of styrene and one or more other low molecular weight monomers.
Type:
Grant
Filed:
June 18, 2009
Date of Patent:
September 2, 2014
Assignee:
Dow Global Technologies LLC
Inventors:
Hanno R. Van der Wal, Ronald Wevers, Freddy Van Damme, Francois M. Casati, Georges Kanaan, Fernand Pla, Sandrine Hoppe, Bart Noordover, Christian Fonteix
Abstract: The instant invention is an ultra-high solid content polyurethane dispersion, and a continuous process for producing ultra-high solid content polyurethane dispersions. The ultra-high solid content polyurethane dispersion includes the reaction product of: (1) a first component, wherein the first component is a first polyurethane prepolymer or a first polyurethane prepolymer emulsion; (2) a second component, wherein the second component is a second polyurethane prepolymer, a second polyurethane prepolymer emulsion, a low solid content polyurethane dispersion, a seed latex, or combinations thereof; (3) and a chain extender. The ultra-high solid content polyurethane dispersion has a solid content of at least 60 percent by weight of the solid, based on the total weight of the ultra-high solid content polyurethane dispersion, and a viscosity in the range of less than 5000 cps at 20 rpm at 21° C. using spindle #4 with Brookfield viscometer.
Abstract: A pretreated titanium silicalite with MFI structure (TS-1) catalyst which has been pretreated with methanol, and then optionally filtered and optionally air-dried to form a pretreated activated TS-1 catalyst. The activated TS-1 may be used in an epoxidation reaction with no additional methanol added and has equivalent activity to TS-1 used with large excesses of methanol. By removing the need for additional methanol during the reaction, the losses of epichlorohydrin from solvolysis are minimized significantly.