Abstract: The present disclosure provides a process. In an embodiment, the process includes A. providing a fitment with a base, the base comprising an ethylene/?-olefin multi-block copolymer; B. placing the base between two opposing multilayer films, each multilayer film having a respective seal layer comprising an olefin-based polymer; C. flat sealing the base to each multilayer film with opposing heated flat seal bars, the flat sealing forming opposing seal joints at the flattened base ends; and D. point sealing the opposing seal joints with opposing curved seal bars.

Abstract: The present disclosure provides a process. In an embodiment, the process includes A. providing a fitment with a base, the base comprising an ethylene/?-olefin multi-block copolymer; B. placing the base between two opposing multilayer films, each multilayer film having a respective seal layer comprising an olefin-based polymer; C. flat sealing the base to each multilayer film with opposing heated flat seal bars, the flat sealing forming opposing seal joints at the flattened base ends; and D. point sealing the opposing seal joints with opposing curved seal bars.

Abstract: A chemical mechanical polishing method is provided comprising: providing a substrate, wherein the substrate comprises a silicon oxide and a silicon nitride; providing a polishing slurry; providing polishing pad, comprising: a polishing layer having a composition that is a reaction product of ingredients, comprising: a polyfunctional isocyanate and an amine initiated polyol curative; wherein the stoichiometric ratio of the amine initiated polyol curative to the polyfunctional isocyanate is selected to tune the removal rate selectivity of the polishing layer; creating dynamic contact between the polishing surface and the substrate; dispensing the polishing slurry on the polishing pad at or near the interface between the polishing surface and the substrate; and, removing at least some of the silicon oxide and the silicon nitride from the substrate.

Abstract: The instant invention provides a polymer composition suitable for clear graphic cling film applications, method of producing the same, articles made therefrom, and methods for making such articles. The polymer composition suitable for clear graphic cling film applications, according to the present invention, comprises: (a) a polyolefin composition selected from the group consisting of a propylene-based composition as described herein, and an ethylene-based composition as described herein, and (b) one or more alkyl phosphate-based release agent; wherein when said polyolefin composition is formed into a clear graphic cling film having a 7 (±2) mils, said clear graphic cling film has a haze of less than 4 percent, for example from 0.3 to 4 percent, measured according to ASTM-D 1003.

Abstract: A lubricant composition comprising (a) from 0.1 to 10 percent by weight of one or more polyalkylene glycols (PAG); and (2) one or more ester base oils selected from the group of natural esters, synthetic esters and combinations thereof; wherein the one or more PAG has a molecular weight in the range 1500 to 5000 g/mole, comprises from 10 to 40 percent by weight of units derived from ethylene oxide and from 90 to 60 percent by weight of units derived from propylene oxide; and wherein the one or more PAGs are in the form of block copolymer, reverse block copolymer or combinations thereof is provided. Also provided is a method of enhancing the hydrolytic stability of an ester base oil.