Patents Assigned to Dry Plasma Systems, Inc.
  • Higher power density downstream plasma
    Patent number: 7015415
    Abstract: A method and system to obtain a high power density plasma to efficiently generate high concentrations of plasma downstream from one or more plasma sources. A first embodiment of the invention involves a method to provide an improved power density for dissociating one or more gases to create plasma. A second embodiment of the invention involves a method to provide multiple chambers for dissociating one or more gases to create plasma. A third embodiment involves an apparatus using a constriction in a discharge chamber containing one or more gases, to provide an improved power density for dissociating one or more gases to create plasma. A fourth embodiment involves an apparatus using a constriction in multiple discharge chambers containing one or more gases, to provide an improved power density for dissociating one or more gases to create plasma.
    Type: Grant
    Filed: February 18, 2004
    Date of Patent: March 21, 2006
    Assignee: Dry Plasma Systems, Inc.
    Inventor: Georges J. Gorin
  • Downstream plasma using oxygen gas mixtures
    Patent number: 6263831
    Abstract: A constriction in the exhaust side of a discharge chamber containing oxygen isolates the oxygen supply from the rest of the system. A constriction of equal size or larger is used in the supply of another gas, thereby enabling mixtures of oxygen and other gases to be used in a downstream plasma system. In one embodiment of the invention, the gases are dissociated separately and then combined in a mixing chamber. In another embodiment, oxygen is dissociated and then a lighter gas is added and the mixture is dissociated. In a preferred embodiment of the invention, the lighter gas is selected from the group consisting of water vapor and nitrogen.
    Type: Grant
    Filed: April 28, 2000
    Date of Patent: July 24, 2001
    Assignee: Dry Plasma Systems, Inc.
    Inventor: Georges J. Gorin
  • Downstream plasma using oxygen gas mixture
    Patent number: 6112696
    Abstract: A constriction in the exhaust side of a discharge chamber containing oxygen isolates the oxygen supply from the rest of the system. A constriction of equal size or larger is used in the supply of another gas, thereby enabling mixtures of oxygen and other gases to be used in a downstream plasma system. In one embodiment of the invention, the gases are dissociated separately and then combined in a mixing chamber. In another embodiment, oxygen is dissociated and then a lighter gas is added and the mixture is dissociated. In a preferred embodiment of the invention, the lighter gas is selected from the group consisting of water vapor and nitrogen.
    Type: Grant
    Filed: February 17, 1998
    Date of Patent: September 5, 2000
    Assignee: Dry Plasma Systems, Inc.
    Inventor: Georges J. Gorin