Abstract: The present invention relates to an aminosilane compound and a composition for a silicon-containing thin film comprising the same, and more particularly, to an aminosilane compound and a composition for a silicon-containing thin film comprising the same having suitable properties that can be used as a precursor for forming a silicon-containing thin film and capable of replacing chlorosilanes.
Type:
Application
Filed:
July 7, 2020
Publication date:
March 30, 2023
Applicant:
DUKSAN TECHOPIA CO., LTD.
Inventors:
Sang Woong YOON, Han Yong YANG, Hyoung Nam KIM, Gun Hyung JO
Abstract: Provided is a SiC precursor for performing SiOCN thin film deposition and a method of forming SiOCN thin film, the method of forming thin film containing a silicon according to the subject matter is performed on a low temperature process that does not require a catalyst, and film deposition rate and process efficiency are excellent according to the subject matter.
Type:
Application
Filed:
March 5, 2019
Publication date:
January 28, 2021
Applicant:
DUKSAN TECHOPIA CO., LTD.
Inventors:
Ja Yeon KIM, Hyoung Nam KIM, Seung Bae PARK, Sangwoong YOON, Soojin LEE