Patents Assigned to DuPoint Air Products Nanomaterials LLC
  • Combination, Method, and Composition for Chemical Mechanical Planarization of A Tungsten-Containing Substrate
    Publication number: 20100159698
    Abstract: A combination, composition and associated method for chemical mechanical planarization of a tungsten-containing substrate are described herein which afford tunability of tungsten/dielectric selectivity and low selectivity for tungsten removal in relation to dielectric material. Removal rates for both tungsten and dielectric are high and stability of the slurry (e.g., with respect to pH drift over time) is high.
    Type: Application
    Filed: December 3, 2009
    Publication date: June 24, 2010
    Applicant: DuPoint Air Products Nanomaterials LLC
    Inventors: Rachel Dianne McConnell, Ann Marie Meyers