Patents Assigned to Dupont Electronic Polymers L.P.
  • Patent number: 7897697
    Abstract: A process for preparing derivatized poly(4-hydroxystryrene) having a novolak type structure which comprises the steps of (i) supplying a solution of methanol containing 4-hydroxyphenylmethylcarbinol, (ii) subjecting said solution to an acid catalyzed displacement reaction for a sufficient period of time and under suitable conditions of temperature and pressure to convert substantially all of said carbinol to 4-hydroxyphenylmethylcarbinol methyl ether in solution, (iii) polymerizing said ether containing solution in the presence of a suitable acid catalyst for a sufficient period of time and under suitable conditions of temperature and pressure to form a novolak type polymer.
    Type: Grant
    Filed: June 24, 2009
    Date of Patent: March 1, 2011
    Assignee: DuPont Electronic Polymers L.P.
    Inventors: Michael T. Sheehan, Edward G. Zey
  • Patent number: 7862983
    Abstract: A composition of matter consisting of a stable solution containing a polymer derived from a solution of a polymer containing trace metals, the derived method comprising the steps of: (a) providing a polymer solution containing a polymer, a first solvent and trace metals; (b) passing said polymer solution through an acidic cation ion exchange material to remove said trace metals therefrom and thereby forming a polymer solution containing free acid radicals; (c) precipitating said polymer from said polymer solution of step b by contacting with a second solvent wherein the polymer is substantially insoluble therein; (d) filtering said solution and said second solvent to thereby form a solid polymer cake; and (e) contacting said cake from step d with sufficient quantities of additional said second solvent in order to remove free acid radicals therefrom.
    Type: Grant
    Filed: May 6, 2010
    Date of Patent: January 4, 2011
    Assignee: DuPont Electronic Polymers L.P.
    Inventors: William Richard Russell, John Anthony Schultz
  • Publication number: 20100221653
    Abstract: A composition of matter consisting of a stable solution containing a polymer derived from a solution of a polymer containing trace metals, the derived method comprising the steps of: (a) providing a polymer solution containing a polymer, a first solvent and trace metals; (b) passing said polymer solution through an acidic cation ion exchange material to remove said trace metals therefrom and thereby forming a polymer solution containing free acid radicals; (c) precipitating said polymer from said polymer solution of step b by contacting with a second solvent wherein the polymer is substantially insoluble therein; (d) filtering said solution and said second solvent to thereby form a solid polymer cake; and (e) contacting said cake from step d with sufficient quantities of additional said second solvent in order to remove free acid radicals therefrom.
    Type: Application
    Filed: May 6, 2010
    Publication date: September 2, 2010
    Applicant: DuPont Electronic Polymers L>P>
    Inventors: William Richard Russell, John Anthony Schultz
  • Patent number: 7741429
    Abstract: A method of making a stable photoresist solution containing a polymer from a solution of a polymer containing trace metals, said method comprising the steps of: (a) providing a polymer solution containing a polymer, a first solvent and trace metals; (b) passing said polymer solution through an acidic cation ion exchange material to remove said trace metals therefrom and thereby forming a polymer solution containing free acid radicals; (c) precipitating said polymer from said polymer solution of step b by contacting with a second solvent wherein the polymer is substantially insoluble therein; (d) filtering said solution and said second solvent to thereby form a solid polymer cake; (e) contacting said cake from step d with sufficient quantities of additional said second solvent in order to remove free acid radicals therefrom; (f) adding a compatible photoresist solvent to said solid polymer cake from step e and mixing the two in order to dissolve said polymer in said photoresist solvent and thereby forming a
    Type: Grant
    Filed: November 17, 2006
    Date of Patent: June 22, 2010
    Assignee: DuPont Electronic Polymers L.P.
    Inventors: William Richard Russell, John Anthony Schultz
  • Patent number: 7728082
    Abstract: A process for producing a stable polymer such as poly(hydroxystyrene) which comprises the decarboxylation of a corresponding phenolic in the presence of a non-amine basic catalyst and a polar organic solvent, followed by the polymerization thereof.
    Type: Grant
    Filed: March 16, 2009
    Date of Patent: June 1, 2010
    Assignee: DuPont Electronic Polymers L.P.
    Inventors: Keith Joseph Kunitsky, Michael Thomas Sheehan, James Ralph Sounik, Mark Elliot Wagman
  • Patent number: 7678945
    Abstract: A process for preparing derivatized poly(4-hydroxystyrene) having a novolak type structure which comprises the steps of (i) supplying a solution of methanol containing 4-hydroxyphenylmethylcarbinol, (ii) subjecting said solution to an acid catalyzed displacement reaction for a sufficient period of time and under suitable conditions of temperature and pressure to convert substantially all of said carbinol to 4-hydroxyphenylmethylcarbinol methyl ether in solution, (iii) polymerizing said ether containing solution in the presence of a suitable acid catalyst for a sufficient period of time and under suitable conditions of temperature and pressure to form a novolak type polymer.
    Type: Grant
    Filed: April 7, 2008
    Date of Patent: March 16, 2010
    Assignee: Dupont Electronic Polymers L.P.
    Inventors: Michael T. Sheehan, Edward G. Zey
  • Patent number: 7632896
    Abstract: A process for preparing derivatized poly(4-hydroxystryrene) having a novolak type structure which comprises the steps of (i) supplying a solution of methanol containing 4-hydroxyphenylmethylcarbinol, (ii) subjecting said solution to an acid catalyzed displacement reaction for a sufficient period of time and under suitable conditions of temperature and pressure to convert substantially all of said carbinol to 4-hydroxyphenylmethylcarbinol methyl ether in solution, (iii) polymerizing said ether containing solution in the presence of a suitable acid catalyst for a sufficient period of time and under suitable conditions of temperature and pressure to form a novolak type polymer.
    Type: Grant
    Filed: April 7, 2008
    Date of Patent: December 15, 2009
    Assignee: Dupont Electronic Polymers L.P.
    Inventors: Michael T. Sheehan, Edward G. Zey
  • Patent number: 7521526
    Abstract: A process for producing a stable polymer such as poly(hydroxystyrene) which comprises the decarboxylation of a corresponding phenolic in the presence of a non-amine basic catalyst and a polar organic solvent, followed by the polymerization thereof.
    Type: Grant
    Filed: July 21, 2007
    Date of Patent: April 21, 2009
    Assignee: Dupont Electronic Polymers L.P.
    Inventors: Keith Joseph Kunitsky, Michael Thomas Sheehan, James Ralph Sounik, Mark Elliot Wagman
  • Patent number: 7371800
    Abstract: A process for preparing derivatized poly(4-hydroxystryrene) having a novolak type structure which comprises the steps of (i) supplying a solution of methanol containing 4-hydroxyphenylmethylcarbinol, (ii) subjecting said solution to an acid catalyzed displacement reaction for a sufficient period of time and under suitable conditions of temperature and pressure to convert substantially all of said carbinol to 4-hydroxyphenylmethylcarbinol methyl ether in solution, (iii) polymerizing said ether containing solution in the presence of a suitable acid catalyst for a sufficient period of time and under suitable conditions of temperature and pressure to form a novolak type polymer.
    Type: Grant
    Filed: April 22, 2005
    Date of Patent: May 13, 2008
    Assignee: DuPont Electronic Polymers L.P.
    Inventors: Michael T. Sheehan, Edward G. Zey
  • Patent number: 7312281
    Abstract: An anhydrous, liquid phase process for preparing hydroxyl containing polymers of enhanced purity comprising the steps of polymerization, purification, transesterification, purification, catalyst removal, and solvent exchange. The resultant polymer in solution can be used directly, without further processing steps, to prepare a photoresist composition.
    Type: Grant
    Filed: February 24, 2005
    Date of Patent: December 25, 2007
    Assignee: DuPont Electronic Polymers L.P.
    Inventors: Michael T. Sheehan, James R. Sounik
  • Patent number: 7148320
    Abstract: Polymers derived from various monomers are purified by fractionalization of the crude polymers in a solvent/non solvent system via reverse precipitation.
    Type: Grant
    Filed: November 24, 2004
    Date of Patent: December 12, 2006
    Assignee: Dupont Electronic Polymers L.P.
    Inventors: Michael T. Sheehan, James R. Sounik