Patents Assigned to Dupont Electronic Polymers L.P.
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Patent number: 7897697Abstract: A process for preparing derivatized poly(4-hydroxystryrene) having a novolak type structure which comprises the steps of (i) supplying a solution of methanol containing 4-hydroxyphenylmethylcarbinol, (ii) subjecting said solution to an acid catalyzed displacement reaction for a sufficient period of time and under suitable conditions of temperature and pressure to convert substantially all of said carbinol to 4-hydroxyphenylmethylcarbinol methyl ether in solution, (iii) polymerizing said ether containing solution in the presence of a suitable acid catalyst for a sufficient period of time and under suitable conditions of temperature and pressure to form a novolak type polymer.Type: GrantFiled: June 24, 2009Date of Patent: March 1, 2011Assignee: DuPont Electronic Polymers L.P.Inventors: Michael T. Sheehan, Edward G. Zey
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Patent number: 7862983Abstract: A composition of matter consisting of a stable solution containing a polymer derived from a solution of a polymer containing trace metals, the derived method comprising the steps of: (a) providing a polymer solution containing a polymer, a first solvent and trace metals; (b) passing said polymer solution through an acidic cation ion exchange material to remove said trace metals therefrom and thereby forming a polymer solution containing free acid radicals; (c) precipitating said polymer from said polymer solution of step b by contacting with a second solvent wherein the polymer is substantially insoluble therein; (d) filtering said solution and said second solvent to thereby form a solid polymer cake; and (e) contacting said cake from step d with sufficient quantities of additional said second solvent in order to remove free acid radicals therefrom.Type: GrantFiled: May 6, 2010Date of Patent: January 4, 2011Assignee: DuPont Electronic Polymers L.P.Inventors: William Richard Russell, John Anthony Schultz
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Publication number: 20100221653Abstract: A composition of matter consisting of a stable solution containing a polymer derived from a solution of a polymer containing trace metals, the derived method comprising the steps of: (a) providing a polymer solution containing a polymer, a first solvent and trace metals; (b) passing said polymer solution through an acidic cation ion exchange material to remove said trace metals therefrom and thereby forming a polymer solution containing free acid radicals; (c) precipitating said polymer from said polymer solution of step b by contacting with a second solvent wherein the polymer is substantially insoluble therein; (d) filtering said solution and said second solvent to thereby form a solid polymer cake; and (e) contacting said cake from step d with sufficient quantities of additional said second solvent in order to remove free acid radicals therefrom.Type: ApplicationFiled: May 6, 2010Publication date: September 2, 2010Applicant: DuPont Electronic Polymers L>P>Inventors: William Richard Russell, John Anthony Schultz
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Patent number: 7741429Abstract: A method of making a stable photoresist solution containing a polymer from a solution of a polymer containing trace metals, said method comprising the steps of: (a) providing a polymer solution containing a polymer, a first solvent and trace metals; (b) passing said polymer solution through an acidic cation ion exchange material to remove said trace metals therefrom and thereby forming a polymer solution containing free acid radicals; (c) precipitating said polymer from said polymer solution of step b by contacting with a second solvent wherein the polymer is substantially insoluble therein; (d) filtering said solution and said second solvent to thereby form a solid polymer cake; (e) contacting said cake from step d with sufficient quantities of additional said second solvent in order to remove free acid radicals therefrom; (f) adding a compatible photoresist solvent to said solid polymer cake from step e and mixing the two in order to dissolve said polymer in said photoresist solvent and thereby forming aType: GrantFiled: November 17, 2006Date of Patent: June 22, 2010Assignee: DuPont Electronic Polymers L.P.Inventors: William Richard Russell, John Anthony Schultz
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Patent number: 7728082Abstract: A process for producing a stable polymer such as poly(hydroxystyrene) which comprises the decarboxylation of a corresponding phenolic in the presence of a non-amine basic catalyst and a polar organic solvent, followed by the polymerization thereof.Type: GrantFiled: March 16, 2009Date of Patent: June 1, 2010Assignee: DuPont Electronic Polymers L.P.Inventors: Keith Joseph Kunitsky, Michael Thomas Sheehan, James Ralph Sounik, Mark Elliot Wagman
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Patent number: 7678945Abstract: A process for preparing derivatized poly(4-hydroxystyrene) having a novolak type structure which comprises the steps of (i) supplying a solution of methanol containing 4-hydroxyphenylmethylcarbinol, (ii) subjecting said solution to an acid catalyzed displacement reaction for a sufficient period of time and under suitable conditions of temperature and pressure to convert substantially all of said carbinol to 4-hydroxyphenylmethylcarbinol methyl ether in solution, (iii) polymerizing said ether containing solution in the presence of a suitable acid catalyst for a sufficient period of time and under suitable conditions of temperature and pressure to form a novolak type polymer.Type: GrantFiled: April 7, 2008Date of Patent: March 16, 2010Assignee: Dupont Electronic Polymers L.P.Inventors: Michael T. Sheehan, Edward G. Zey
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Patent number: 7632896Abstract: A process for preparing derivatized poly(4-hydroxystryrene) having a novolak type structure which comprises the steps of (i) supplying a solution of methanol containing 4-hydroxyphenylmethylcarbinol, (ii) subjecting said solution to an acid catalyzed displacement reaction for a sufficient period of time and under suitable conditions of temperature and pressure to convert substantially all of said carbinol to 4-hydroxyphenylmethylcarbinol methyl ether in solution, (iii) polymerizing said ether containing solution in the presence of a suitable acid catalyst for a sufficient period of time and under suitable conditions of temperature and pressure to form a novolak type polymer.Type: GrantFiled: April 7, 2008Date of Patent: December 15, 2009Assignee: Dupont Electronic Polymers L.P.Inventors: Michael T. Sheehan, Edward G. Zey
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Patent number: 7521526Abstract: A process for producing a stable polymer such as poly(hydroxystyrene) which comprises the decarboxylation of a corresponding phenolic in the presence of a non-amine basic catalyst and a polar organic solvent, followed by the polymerization thereof.Type: GrantFiled: July 21, 2007Date of Patent: April 21, 2009Assignee: Dupont Electronic Polymers L.P.Inventors: Keith Joseph Kunitsky, Michael Thomas Sheehan, James Ralph Sounik, Mark Elliot Wagman
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Patent number: 7371800Abstract: A process for preparing derivatized poly(4-hydroxystryrene) having a novolak type structure which comprises the steps of (i) supplying a solution of methanol containing 4-hydroxyphenylmethylcarbinol, (ii) subjecting said solution to an acid catalyzed displacement reaction for a sufficient period of time and under suitable conditions of temperature and pressure to convert substantially all of said carbinol to 4-hydroxyphenylmethylcarbinol methyl ether in solution, (iii) polymerizing said ether containing solution in the presence of a suitable acid catalyst for a sufficient period of time and under suitable conditions of temperature and pressure to form a novolak type polymer.Type: GrantFiled: April 22, 2005Date of Patent: May 13, 2008Assignee: DuPont Electronic Polymers L.P.Inventors: Michael T. Sheehan, Edward G. Zey
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Patent number: 7312281Abstract: An anhydrous, liquid phase process for preparing hydroxyl containing polymers of enhanced purity comprising the steps of polymerization, purification, transesterification, purification, catalyst removal, and solvent exchange. The resultant polymer in solution can be used directly, without further processing steps, to prepare a photoresist composition.Type: GrantFiled: February 24, 2005Date of Patent: December 25, 2007Assignee: DuPont Electronic Polymers L.P.Inventors: Michael T. Sheehan, James R. Sounik
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Patent number: 7148320Abstract: Polymers derived from various monomers are purified by fractionalization of the crude polymers in a solvent/non solvent system via reverse precipitation.Type: GrantFiled: November 24, 2004Date of Patent: December 12, 2006Assignee: Dupont Electronic Polymers L.P.Inventors: Michael T. Sheehan, James R. Sounik