Abstract: An apparatus for storing contamination-sensitive flat articles, in particular for storing semiconductor wafers, comprises a plurality of box-like compartments stationary arranged on a fixed mounting rack. The compartments are open on a front side and are arranged in rows and columns side by side and one above the other on the fixed mounting rack. The compartments each have a plurality of slotted holders for receiving the flat articles, and they surround a first handling unit configured for automatically inserting and removing the flat articles into and out of the slotted holders. A closed housing forms a clean room where both the plurality of compartments and the first handling unit are arranged.

Abstract: An apparatus and a method serve for cleaning articles used in the production of semiconductors, such as wafers, containers for transporting wafers (known as FOUPs), LCD substrates and photomasks. The articles are cleaned in a treatment chamber by means of a liquid and subsequently dried. A drying gas, such as air, is circulated within the treatment chamber and a condensation dryer is provided for extracting moisture from the gas.