Patents Assigned to Dynamic Micro Systems
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Patent number: 8591664Abstract: Methods and apparatuses for integrated cleaning of objects comprising a sequence of wet cleaning and vacuum drying in a same process chamber. The present integrated cleaning process can eliminate moving parts, improving the system reliability. Vacuum decontamination can be included for degassing and decontaminating the cleaned objects. In an embodiment, a cleaner system combines various movements into an integrated movement to be handled by a robot, for example, to improve the throughput. For example, an integrated robot movement comprising picking up a closed container from the input load port, moving both the lid and body together, and then depositing the body and lid separately into the appropriate positions in the cleaner to be cleaned.Type: GrantFiled: June 17, 2010Date of Patent: November 26, 2013Assignees: Dynamic Micro SystemInventor: Lutz Rebstock
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Publication number: 20130058743Abstract: The present invention relates to apparatuses and methods to store and transfer objects, and more particularly to workpiece stocker configurations such as stocker for semiconductor wafers, reticles or carrier boxes.Type: ApplicationFiled: September 5, 2011Publication date: March 7, 2013Applicant: Dynamic Micro Systems, Semiconductor Equipment GmbHInventor: Lutz Rebstock
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Patent number: 8376428Abstract: An integrated grip arm comprises a plurality of grippers to accommodate a plurality of reticles and carrier boxes without the need of separate arm or gripper changes. The integrated grip arm can comprise an edge gripper for gripping a reticle or a carrier box at the edges, and a fork gripper for gripping a reticle or a carrier box at a top and a bottom portions. The integrated grip arm can comprise an edge gripper for gripping a wafer from the edges and an end effector for holding a wafer from the bottom. The integrated grip arm can comprise a vertical gripper for gripping a workpiece from a vertical position and a horizontal gripper for gripping a workpiece from a horizontal position.Type: GrantFiled: July 25, 2007Date of Patent: February 19, 2013Assignee: Dynamic Micro System Semiconductor Equipment GmbHInventor: Lutz Rebstock
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Publication number: 20130028691Abstract: An integrated robotic mechanism is disclosed for improving transport equipment, integrating an object movement with other functionalities such as alignment or identification. The disclosed integrated robot assembly can comprise a multiple end effector for moving a plurality of workpieces, a single end effector for moving a single workpiece, a rotation chuck incorporated on the robot body to provide alignment capability, and an optional identification subsystem for identify the object during transport. The present invention robot assembly can be used in a sorter or stocker equipment, in processing equipment, and a transfer system.Type: ApplicationFiled: October 1, 2012Publication date: January 31, 2013Applicant: Dynamic Micro Systems, Semiconductor Equipment GmbHInventors: Farzad Tabrizi, David Barker
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Publication number: 20130021465Abstract: The present invention discloses apparatuses and methods for simultaneous viewing and reading top and bottom images from a workpiece. The present ID reader can comprise an enclosure covering a top and bottom section of the workpiece with optical elements to guide the light from the workpiece images to a camera. The optical element can be disposed to receive images from a high angle with respect to the surface of the workpiece. The present ID reader can further comprise a light source assembly to illuminate the image. The light source assembly can utilize a coaxial light path with the images, preferably for bright field illumination. The light source assembly can also utilize a non-coaxial light path, preferably for dark field illumination.Type: ApplicationFiled: July 25, 2012Publication date: January 24, 2013Applicant: Dynamic Micro Systems, Semiconductor Equipment GmbHInventor: David Barker
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Publication number: 20130004268Abstract: In an embodiment, the present invention discloses cleaned storage processes and systems for high level cleanliness articles, such as extreme ultraviolet (EUV) reticle carriers. A decontamination chamber can be used to clean the stored workpieces. A purge gas system can be used to prevent contamination of the articles stored within the workpieces. A robot can be used to detect the condition of the storage compartment before delivering the workpiece. A monitor device can be used to monitor the conditions of the stocker.Type: ApplicationFiled: June 28, 2012Publication date: January 3, 2013Applicant: Dynamic Micro Systems, Semiconductor Equipment GmbHInventor: Lutz Rebstock
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Publication number: 20130000676Abstract: In an embodiment, the present invention discloses cleaned storage processes and systems for high level cleanliness articles, such as extreme ultraviolet (EUV) reticle carriers. A decontamination chamber can be used to clean the stored workpieces. A purge gas system can be used to prevent contamination of the articles stored within the workpieces. A robot can be used to detect the condition of the storage compartment before delivering the workpiece. A monitor device can be used to monitor the conditions of the stocker.Type: ApplicationFiled: June 28, 2012Publication date: January 3, 2013Applicant: Dynamic Micro Systems, Semiconductor Equipment GmbHInventor: Lutz Rebstock
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Publication number: 20130000254Abstract: In an embodiment, the present invention discloses cleaned storage processes and systems for high level cleanliness articles, such as extreme ultraviolet (EUV) reticle carriers. A decontamination chamber can be used to clean the stored workpieces. A purge gas system can be used to prevent contamination of the articles stored within the workpieces. A robot can be used to detect the condition of the storage compartment before delivering the workpiece. A monitor device can be used to monitor the conditions of the stocker.Type: ApplicationFiled: June 28, 2012Publication date: January 3, 2013Applicant: Dynamic Micro Systems, Semiconductor Equipment GmbHInventor: Lutz Rebstock
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Publication number: 20130004270Abstract: In an embodiment, the present invention discloses cleaned storage processes and systems for high level cleanliness articles, such as extreme ultraviolet (EUV) reticle carriers. A decontamination chamber can be used to clean the stored workpieces. A purge gas system can be used to prevent contamination of the articles stored within the workpieces. A robot can be used to detect the condition of the storage compartment before delivering the workpiece. A monitor device can be used to monitor the conditions of the stocker.Type: ApplicationFiled: June 28, 2012Publication date: January 3, 2013Applicant: Dynamic Micro Systems, Semiconductor Equipment GmbHInventor: Lutz Rebstock
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Publication number: 20120328403Abstract: In an embodiment, the present invention discloses a EUV cleaner system and process for cleaning a EUV carrier. The euv cleaner system comprises separate dirty and cleaned environments, separate cleaning chambers for different components of the double container carrier, gripper arms for picking and placing different components using a same robot handler, gripper arms for holding different components at different locations, horizontal spin cleaning and drying for outer container, hot water and hot air (70C) cleaning process, vertical nozzles and rasterizing megasonic nozzles for cleaning inner container with hot air nozzles for drying, separate vacuum decontamination chambers for outgassing different components, for example, one for inner and one for outer container with high vacuum (e.g., <10?6 Torr) with purge gas, heaters and RGA sensors inside the vacuum chamber, purge gas assembling station, and purge gas loading and unloading station.Type: ApplicationFiled: June 23, 2012Publication date: December 27, 2012Applicant: Dynamic Micro Systems, Semiconductor Equipment GmbHInventor: Lutz Rebstock
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Publication number: 20120325269Abstract: In an embodiment, the present invention discloses a EUV cleaner system and process for cleaning a EUV carrier. The euv cleaner system comprises separate dirty and cleaned environments, separate cleaning chambers for different components of the double container carrier, gripper arms for picking and placing different components using a same robot handler, gripper arms for holding different components at different locations, horizontal spin cleaning and drying for outer container, hot water and hot air (70 C) cleaning process, vertical nozzles and rasterizing megasonic nozzles for cleaning inner container with hot air nozzles for drying, separate vacuum decontamination chambers for outgassing different components, for example, one for inner and one for outer container with high vacuum (e.g., <10?6 Torr) with purge gas, heaters and RGA sensors inside the vacuum chamber, purge gas assembling station, and purge gas loading and unloading station.Type: ApplicationFiled: June 23, 2012Publication date: December 27, 2012Applicant: Dynamic Micro Systems, Semiconductor Equipment GmbHInventor: Lutz Rebstock
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Publication number: 20120325273Abstract: In an embodiment, the present invention discloses a EUV cleaner system and process for cleaning a EUV carrier. The euv cleaner system comprises separate dirty and cleaned environments, separate cleaning chambers for different components of the double container carrier, gripper arms for picking and placing different components using a same robot handler, gripper arms for holding different components at different locations, horizontal spin cleaning and drying for outer container, hot water and hot air (70 C) cleaning process, vertical nozzles and rasterizing megasonic nozzles for cleaning inner container with hot air nozzles for drying, separate vacuum decontamination chambers for outgassing different components, for example, one for inner and one for outer container with high vacuum (e.g., <10?6 Torr) with purge gas, heaters and RGA sensors inside the vacuum chamber, purge gas assembling station, and purge gas loading and unloading station.Type: ApplicationFiled: June 23, 2012Publication date: December 27, 2012Applicant: Dynamic Micro Systems, Semiconductor Equipment GmbHInventor: Lutz Rebstock
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Publication number: 20120325272Abstract: In an embodiment, the present invention discloses a EUV cleaner system and process for cleaning a EUV carrier. The euv cleaner system comprises separate dirty and cleaned environments, separate cleaning chambers for different components of the double container carrier, gripper arms for picking and placing different components using a same robot handler, gripper arms for holding different components at different locations, horizontal spin cleaning and drying for outer container, hot water and hot air (70 C) cleaning process, vertical nozzles and rasterizing megasonic nozzles for cleaning inner container with hot air nozzles for drying, separate vacuum decontamination chambers for outgassing different components, for example, one for inner and one for outer container with high vacuum (e.g., <10?6 Torr) with purge gas, heaters and RGA sensors inside the vacuum chamber, purge gas assembling station, and purge gas loading and unloading station.Type: ApplicationFiled: June 23, 2012Publication date: December 27, 2012Applicant: Dynamic Micro Systems, Semiconductor Equipment GmbHInventor: Lutz Rebstock
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Publication number: 20120325271Abstract: In an embodiment, the present invention discloses a EUV cleaner system and process for cleaning a EUV carrier. The euv cleaner system comprises separate dirty and cleaned environments, separate cleaning chambers for different components of the double container carrier, gripper arms for picking and placing different components using a same robot handler, gripper arms for holding different components at different locations, horizontal spin cleaning and drying for outer container, hot water and hot air (70 C) cleaning process, vertical nozzles and rasterizing megasonic nozzles for cleaning inner container with hot air nozzles for drying, separate vacuum decontamination chambers for outgassing different components, for example, one for inner and one for outer container with high vacuum (e.g., <10?6 Torr) with purge gas, heaters and RGA sensors inside the vacuum chamber, purge gas assembling station, and purge gas loading and unloading station.Type: ApplicationFiled: June 23, 2012Publication date: December 27, 2012Applicant: Dynamic Micro Systems, Semiconductor Equipment GmbHInventor: Lutz Rebstock
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Publication number: 20120258240Abstract: Coating rollers accepting liquid media provide liquid chemicals to substrates for depositing a thin coating layer on the flat substrates, such as semiconductors or panels. The liquid media is cooled to a life-preserving temperature while shielded from the thermal energy heating the substrates to prevent degrading the liquid media. Physical barrier or temperature barrier can be established in vicinities of the rollers to further limit exposing the liquid media to high temperature.Type: ApplicationFiled: August 16, 2011Publication date: October 11, 2012Applicant: Dynamic Micro Systems, Semiconductor Equipment GmbHInventor: Lutz Rebstock
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Publication number: 20120258262Abstract: Methods and apparatuses for a deposition system are provided to deposit a thin coating layer on flat substrates, such as semiconductors or panels. In an embodiment, liquid supplied rollers accepting liquid media provide liquid chemicals to the substrates for coating the substrates. The liquid delivery system can control the flow and the pressure of the liquid to achieve optimum process condition with minimum excess waste. In another embodiment, rollers with non-uniform distribution of liquid media provide a non-uniform thickness profile on the substrates, which can be used to compensate for the non-uniformity of subsequent processes.Type: ApplicationFiled: April 7, 2011Publication date: October 11, 2012Applicant: Dynamic Micro Systems, Semiconductor Equipment GmbHInventors: Lutz Rebstock, Klaus Conrad Wolke
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Publication number: 20120255488Abstract: Methods and apparatuses for a deposition system are provided to deposit a thin coating layer on flat substrates, such as semiconductors or panels. In an embodiment, liquid supplied rollers accepting liquid media provide liquid chemicals to the substrates for coating the substrates. The liquid delivery system can control the flow and the pressure of the liquid to achieve optimum process condition with minimum excess waste. In another embodiment, rollers with non-uniform distribution of liquid media provide a non-uniform thickness profile on the substrates, which can be used to compensate for the non-uniformity of subsequent processes.Type: ApplicationFiled: April 7, 2011Publication date: October 11, 2012Applicant: Dynamic Micro Systems, Semiconductor Equipment GmbHInventors: Lutz Rebstock, Klaus Conrad Wolke
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Patent number: 8277165Abstract: An integrated robotic mechanism is disclosed for improving transport equipment, integrating an object movement with other functionalities such as alignment or identification. The disclosed integrated robot assembly can comprise a multiple end effector for moving a plurality of workpieces, a single end effector for moving a single workpiece, a rotation chuck incorporated on the robot body to provide alignment capability, and an optional identification subsystem for identify the object during transport. The present invention robot assembly can be used in a sorter or stocker equipment, in processing equipment, and a transfer system.Type: GrantFiled: September 22, 2007Date of Patent: October 2, 2012Assignee: Dynamic Micro System Semiconductor Equipment GmbHInventors: Farzad Tabrizi, David Barker
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Patent number: 8233696Abstract: The present invention discloses apparatuses and methods for simultaneous viewing and reading top and bottom images from a workpiece. The present ID reader can comprise an enclosure covering a top and bottom section of the workpiece with optical elements to guide the light from the workpiece images to a camera. The optical element can be disposed to receive images from a high angle with respect to the surface of the workpiece. The present ID reader can further comprise a light source assembly to illuminate the image. The light source assembly can utilize a coaxial light path with the images, preferably for bright field illumination. The light source assembly can also utilize a non-coaxial light path, preferably for dark field illumination. In an embodiment, the simultaneous images reaching the camera are separate into two distinct images on two different sections of the camera. In another embodiment, the simultaneous images reaching the camera are superimposed into one image on the camera.Type: GrantFiled: September 22, 2007Date of Patent: July 31, 2012Assignee: Dynamic Micro System Semiconductor Equipment GmbHInventor: David Barker
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Patent number: 8182198Abstract: A redundantable robotic mechanism is disclosed for improving reliability of tranport equipment. The redundantable robot assembly typically comprises independent robots with separate controls, motors, linkage arms, or power, thus providing the capability of operation even if parts of the assembly are not operational or when parts of the assembly are removed for repair. The redundantable robot assembly can be also designed to allow in-situ servicing, e.g. servicing one robot when the other is running. The disclosed redundantable robot assembly provides virtual uninterrupted process flow, and thus greatly increases the yield for the manufacturing facility.Type: GrantFiled: July 25, 2007Date of Patent: May 22, 2012Assignee: Dynamic Micro Systems Semiconductor Equipment GmbHInventor: Lutz Rebstock