Patents Assigned to E BEAM INC.
  • Patent number: 10794371
    Abstract: Plasma cathodes for micro Hall and ion thrusters of unprecedented power efficiency, low cost, compactness, are provided. The cathodes employ, for example, a very small planar scandate cathode as electron source, delivering over 350 ma of discharge from an emitter area as small as only 0.012 cm2.
    Type: Grant
    Filed: September 16, 2019
    Date of Patent: October 6, 2020
    Assignee: E BEAM INC.
    Inventors: Bernard K Vancil, Joseph Kowalski, Jereme Shaver
  • Publication number: 20200240398
    Abstract: Plasma cathodes for micro Hall and ion thrusters of unprecedented power efficiency, low cost, compactness, are provided. The cathodes employ, for example, a very small planar scandate cathode as electron source, delivering over 350 ma of discharge from an emitter area as small as only 0.012 cm2.
    Type: Application
    Filed: September 16, 2019
    Publication date: July 30, 2020
    Applicant: E BEAM INC.
    Inventors: Bernard K. Vancil, Joseph Kowalski, Jereme Shaver