Patents Assigned to e-Beam & Light, Inc.
  • Publication number: 20150233612
    Abstract: The invention is a thermal recycling system for converting lower quality thermal sources into higher quality thermal sources. In one embodiment, at least one photonic crystal radiator is combined with at least one substantially different radiator within a low loss thermal recycling cavity. Thermal recycling is based on the use of spectrum, polarization and temporal restrictions. These systems can be used in cooling, heating, and energy production.
    Type: Application
    Filed: May 2, 2015
    Publication date: August 20, 2015
    Applicant: e-Beam & Light, Inc.
    Inventors: Scott M. Zimmerman, William R. Livesay
  • Patent number: 7546016
    Abstract: An optical element such as an interference filter will have adjacent layers of different indexes of refraction but formed of the same optical material. An optical element such as a diffraction grating or beam-splitter will have adjacent sections of different indexes of refraction in the same optical material layer. An optical element such as a waveguide will have a core layer of a higher index of refraction partially or completely surrounded by a cladding layer of a lower index of refraction formed of the same optical material.
    Type: Grant
    Filed: September 20, 2005
    Date of Patent: June 9, 2009
    Assignee: e-Beam & Light, Inc.
    Inventors: William R. Livesay, Scott M. Zimmerman
  • Patent number: 7253425
    Abstract: The exposure of selected optical materials to large area electron beam irradiation can raise the refractive index of the optical material to allow the fabrication of waveguides, optical fibers, gradient index lenses, interference filters, antireflection coatings, heat reflective thermal control coatings and other optical elements.
    Type: Grant
    Filed: September 20, 2005
    Date of Patent: August 7, 2007
    Assignee: e-Beam & Light, Inc.
    Inventors: William R. Livesay, Scott M. Zimmerman
  • Patent number: 7026634
    Abstract: The invention provides a process for forming optical components and new optical materials utilizing electron beam irradiation. The process comprises selectively irradiating optical materials to alter their index of refraction gradient three dimensionally. With the inventive process, new optical materials can be created that have enhanced optical properties over the un-irradiated material. The invention also provides a process in which optical components can be fabricated without requiring a planar/multiple layer process, thereby simplifying the fabrication of these optical components. The inventive process uses a controlled electron beam to alter the properties of optical materials. By using the radiation of a controlled electron beam, controlled changes in the index of refraction gradient of optical materials can be obtained. Further, radiation of the electron beam can be used to create new optical materials from materials not previously believed to be suitable for optical applications.
    Type: Grant
    Filed: June 27, 2002
    Date of Patent: April 11, 2006
    Assignee: e-Beam & Light, Inc.
    Inventors: William R. Livesay, Scott M. Zimmerman