Patents Assigned to E/G ELECTROGRAPH INC.
  • MAGNETIC FIELD REDUCTION APPARATUS AND MAGNETIC PLASMA FLOOD SYSTEM FOR ION BEAM PROCESSING
    Publication number: 20130113378
    Abstract: An ion beam processing system includes a plasma generator with a magnetic flood system. Magnets are provided for reducing the transverse magnetic field in the ion beam transport region of the plasma flood device so as to control charging damage or to neutralize beam space charge in ion beam processing and semiconductor ion implantation. The system is especially adapted for beam lines with ribbon beams.
    Type: Application
    Filed: November 9, 2012
    Publication date: May 9, 2013
    Applicant: E/G ELECTROGRAPH INC.
    Inventor: E/G ELECTROGRAPH INC.