Abstract: An electrical element includes an optically-detectable pattern of embedded information. A plurality of thin-film layers is applied on the surface of the substrate wherein one or more of the thin-film layers is at least partially transparent. The plurality of thin-film layers overlaps in an encoding region to form an optical layer structure, wherein at least one of the thin-film layers in the optical layer structure contributes to an electrical function of the electrical element. At least one of the thin-film layers in the optical layer structure includes an information-encoding pattern which contributes to an optically-detectable interference image when illuminated by incident light, and wherein the optically-detectable interference image corresponds to at least a portion of the pattern of embedded information.

Abstract: A transparent antenna includes a conductive material disposed on a surface of a non-opaque substrate in one or more conductive regions, wherein a geometry of the conductive regions defines an antenna pattern. A non-conductive material is disposed on the surface of the substrate in a fill pattern which is an inverse of the antenna pattern. An average optical transparency in the conductive regions and the non-conductive regions is at least 50%, and the average optical transparency in the conductive regions differs from that of the non-conductive regions by no more than 10%.

Abstract: A deposition unit for a thin film deposition system includes one or more of deposition heads and a gas manifold. Each deposition head includes an output face having a plurality of gas openings, a mounting face including a plurality of deposition head gas ports, and connecting gas passages. The gas manifold includes an attachment face having one or more interface regions, each interface region including a plurality of manifold gas ports in positions corresponding to the deposition head gas ports. Each deposition head is fastened to the gas manifold in an interface region with sealing elements positioned between the manifold gas ports and the deposition head gas ports. The mounting face of each deposition head and the attachment face of the gas manifold include alignment features for aligning each deposition head with the interface region of the gas manifold.

Abstract: A photosensitive reducible silver ion-containing composition can be used to provide electrically-conductive silver metal in thin films or patterns. This composition comprises: a) a non-hydroxylic-solvent soluble silver complex represented by the following formula (I): (Ag+)a(L)b(P)c?? (I) wherein L represents an ?-oxy carboxylate; P represents an oxime compound; a is 1 or 2; b is 1 or 2; and c is 1, 2, 3, or 4, provided that when a is 1, b is 1, and when a is 2, b is 2; b) optionally, a photosensitizer that can either reduce the reducible silver ion or oxidize the ?-oxy carboxylate; and c) a solvent medium comprising at least one non-hydroxylic solvent. Electrically-conductive silver can be provided by photochemical conversion of the reducible silver ions in the complex.

Abstract: A method is used to prepare silver nanoparticles or copper nanoparticles in the form of a silver nanoparticle cellulosic polymeric composite or a copper nanoparticle cellulose polymeric composite, respectively. A cellulosic polymer, organic solvent having a boiling point at atmospheric pressure of 100° C. to 500° C. and a Hansen parameter (?TPolymer) equal to or greater than that of the cellulosic polymer, ascorbic acid, and a nitrogenous base are mixed to form a premix solution. At room temperature or upon heating the premix solution to a temperature of at least 40° C., a solution of reducible silver ions or reducible copper ions is added. The resulting silver or copper nanoparticle composite is cooled, isolated, and re-dispersed in an organic solvent, providing a non-aqueous silver-containing or copper-containing dispersion that can be disposed on a substrate to form an article.

Abstract: An inkjet printing method uses an aqueous inkjet ink composition having a non-crosslinked, crosslinkable polyurethane having an acid number of 20-40 and is derived from an aromatic diisocyanate; and a diol mixture of D1 and D2 diols, and optionally including D3 diol, D4 diol, or both D3 and D4 diols. D1 has a C3 to C7 aliphatic group and a pendant carboxy group or neutralized carboxy group. D2 has a chain of repeating C2 to C6 alkylene oxide groups. D3 is an alkoxylated bisphenol A or aliphatic cyclic diol, present at least 5 mol %. D4 is a hydroxy-terminated polybutadiene having a molecular weight of at least 1000 and is present in an amount of 0.1-5 mol %. The ink composition also contains a dispersed pigment colorant; a humectant or organic co-solvent, and optionally, a crosslinking agent.

Abstract: A method is used to prepare silver nanoparticles in the form of a silver nanoparticle cellulosic polymeric composite. A cellulosic polymer, organic solvent having a boiling point at atmospheric pressure of 100° C. to 500° C. and a Hansen parameter (?TPolymer) equal to or greater than that of the cellulosic polymer, and a nitrogenous base are mixed to form a premix solution. Upon heating the premix solution to a temperature of at least 75° C., a solution of reducible silver ions is added that is equimolar or less in relation to the nitrogenous base. The weight ratio of reducible silver ions to the cellulosic polymer is 5:1 to 50:1. The resulting silver nanoparticle composite is cooled, isolated, and re-dispersed in an organic solvent, providing a non-aqueous silver-containing dispersion comprising the silver nanoparticle cellulosic polymeric composite.

Abstract: A material deposition system for depositing a material on a surface of a substrate includes a deposition head having an output face configured to simultaneously supply a plurality of gaseous materials in a sequence of gas zones. The gas zones include a deposition zone located between first and second inert zones. The deposition zone includes a first reactant zone adjacent to the first inert zone, a last reactant zone adjacent to the second inert zone, and one or more purge gas zones. A motion actuator moves a substrate over the output face with a repeating motion profile that prevents a region of active deposition on the substrate from being exposed to the external environment prior to having achieved a final material deposition amount. The repeating motion profile include a forward motion portion and a backward motion portion which is less than the forward distance by an ooch distance.

Abstract: A fuser apparatus includes first and second rollers in nip relation to transport a receiver member therebetween. A stripping mechanism a skive assembly having an elongated, thin, flexible skive finger, wherein a tip of the skive finger is beveled forming a sharp edge along an upper surface of the skive finger. At least one raised bump protrudes from the lower surface of the skive finger, spaced apart from a tip of the skive finger. A mounting mechanism positions the skive finger in operative relation to the first roller with the at least one raised bump contacting the surface of the first roller at a contact point such that the sharp edge along the first surface of the skive finger is spaced apart from the surface of the first roller by a distance of between 50 and 120 microns.

Abstract: A dual gas-bearing system includes a vacuum-preloaded gas bearing, a substrate, and a gas-bearing backer. The vacuum-preloaded gas bearing is mounted to a machine base in a fixed location. The substrate has a first surface facing the output face of the vacuum-preloaded gas bearing and an opposing second surface facing the output face of the gas-bearing backer. The gas-bearing is freely moveable in a direction normal to the output face of the vacuum-preloaded gas bearing. A gas flow through the output face of the vacuum-preloaded gas bearing imparts a first net force onto the first surface of the substrate, and a gas flow through the gas-bearing backer imparts a second net force onto the second surface of the substrate, wherein the second net force and the gap between the output face of the gas-bearing backer are independent of the position and thickness of the substrate.

Abstract: A deposition unit for a thin film deposition system includes a plurality of deposition heads. Each deposition head includes an output face having a plurality of gas slots extending in a cross-track direction. Two of the deposition heads are positioned adjacent to each other in the cross-track direction such that the adjacent deposition heads have abutting ends. The abutting ends of the adjacent deposition heads include interlocking structures having an alternating sequence of protrusions and recesses such that the protrusions on the abutting end of one adjacent deposition head fit into the recesses on the abutting end of the other adjacent deposition head. The gas slots extend into the protrusions on the abutting ends such that in an overlap region, the gas slots of one adjacent deposition head overlap with the gas slots of the other adjacent deposition head.

Abstract: A semiconductor device can be prepared using a precursor dielectric composition that comprises: (1) a photochemically or thermally crosslinked product of a photocurable or thermally curable thiosulfate-containing polymer that has a Tg of at least 50° C. and that comprises: an organic polymer backbone comprising (a) recurring units comprising pendant thiosulfate groups; and further comprises charge balancing cations, and (2) optionally, an electron-accepting photo sensitizer component. The electronic device can be prepared by independently applying the precursor dielectric composition and an organic semiconductor composition to a substrate to form an applied precursor dielectric composition and an applied organic semiconductor composition, respectively, and subjecting the applied precursor dielectric composition to curing conditions to form a gate dielectric layer that is in physical contact with the applied organic semiconductor composition.

Abstract: A non-aqueous silver precursor composition is composed of (a) one or more cellulosic polymers; (b) reducible silver ions that are present at a weight ratio to the one or more cellulosic polymers of 5:1 to 50:1; (c) an organic solvent that has a boiling point at atmospheric pressure of at least 100° C. and up to but less than 500° C.; and (d) a nitrogenous base having a pKa in acetonitrile of at least 15 and up to and including 25 at 25° C. The Hansen parameter (?TPolymer) of each cellulosic polymer is less than or equal to the Hansen parameter (?TSolvent) each organic solvent. In addition, the (d) nitrogenous base is present in an equimolar amount or molar excess in relation to the amount of (b) reducible silver ions.

Abstract: On-press developable, negative-working lithographic printing plate precursors are used to provide lithographic printing plates. Such precursors are prepared with a substrate and one or more negative-working, infrared radiation-sensitive imagable layers. The substrate is prepared by two separate anodizing processes to provide an inner aluminum oxide layer having an average dry thickness (Ti) of 650-3,000 nm and inner micropores having an average inner micropore diameter (Di) of <15 nm. A formed outer aluminum oxide layer comprises outer micropores having an average outer micropore diameter (Do) of 15-30 nm; an average dry thickness (To) of 130-650 nm; and a micropore density (Co) of 500-3,000 micropores/?m2. The ratio of Do to Di is greater than 1.1:1, and Do in nanometers and the outer aluminum oxide layer micropore density (Co) in micropores/?m2, are further defined by the outer aluminum oxide layer porosity (Po) as: 0.3?Po?0.8 wherein Po is 3.14(Co)(Do2)/4,000,000.

Abstract: Electrically-conductive silver metal can be provided in a thin film or pattern on a substrate from a silver complex having reducing silver ions and represented by: wherein L represents an ?-oxy carboxylate; P represents a primary alkylamine compound; a is 1 or 2; b is 1 or 2; and c is 1, 2, 3, or 4, provided that when a is 1, b is 1, and when a is 2, b is 2. The silver complex is mixed in a hydroxy-free, nitrile-containing aprotic solvent with a polymer that is either (i) a hydroxy-containing cellulosic polymer or (ii) a non-cellulosic acrylic polymer having a halo- or hydroxy-containing side chain. The reducible silver ions in the a thermally sensitive thin film or pattern can be thermally converted to electrically-conductive metallic silver under suitable heating conditions to provide a product article that can be used in various devices.

Abstract: A method for providing electrically-conductive silver-containing metal in a thin film or one or more thin film patterns on a substrate. Electrically-conductive metallic silver is provided from a non-hydroxylic-solvent soluble silver complex represented by the following formula (I): (Ag+)a(L)b(P)c??(I) wherein L represents an ?-oxy carboxylate; P represents an oxime compound; a is 1 or 2; b is 1 or 2; and c is 1, 2, 3, or 4, provided that when a is 1, b is 1, and when a is 2, b is 2. A photosensitizer can also be present. The reducible silver ions in the photosensitive thin film or photosensitive thin film pattern can be photochemically converted to electrically-conductive metallic silver in the thin films or thin film patterns by irradiation with electromagnetic radiation having a wavelength within the range of at least 150 nm and up to and including 700 nm.

Abstract: Electrically-conductive silver metal can be provided in a thin film or pattern on a substrate from a silver complex having reducing silver ions and represented by: (Ag+)a(L)b(P)c?? (I) wherein L represents an ?-oxy carboxylate; P represents a 5- or 6-membered N-heteroaromatic compound; a is 1 or 2; b is 1 or 2; and c is 1, 2, 3, or 4, provided that when a is 1, b is 1, and when a is 2, b is 2. The silver complex is mixed in a hydroxy-free, nitrile-containing aprotic solvent with a polymer that is either (i) a hydroxy-containing cellulosic polymer or (ii) a non-cellulosic acrylic polymer having a halo- or hydroxy-containing side chain. The reducible silver ions in the a thermally sensitive thin film or pattern can be thermally converted to electrically-conductive metallic silver under suitable heating conditions to provide a product article that can be used in various devices.

Abstract: A precursor article has a substrate and a photosensitive thin film or a photosensitive thin film pattern on a supporting side. The photosensitive thin film and each photosensitive thin film patterns comprises a non-hydroxylic-solvent soluble silver complex that is represented by the following formula (I): (Ag+)a(L)b(P)c?? (I) wherein L represents an ?-oxy carboxylate; P represents a 5- or 6-membered N-heteroaromatic compound; a is 1 or 2; b is 1 or 2; and c is 1, 2, 3, or 4, provided that when a is 1, b is 1, and when a is 2, b is 2. A photosensitizer that can either reduce the reducible silver ion or oxidize the ?-oxy carboxylate having a reduction potential can also be present. Such precursor articles can be irradiated with UV-visible radiation to reduce the silver ions to provide electrically-conductive metallic silver in thin films or thin film patterns in product articles or devices.

Abstract: A pattern of information is detected in a thin-film electrical element including a plurality of thin-film layers on a substrate, the plurality of thin-film layers overlapping in an encoding region to form an optical layer structure. At least one of the thin-film layers in the optical layer structure includes an embedded information-encoding pattern. The thin-film electrical element is illuminated with an incident light beam from a light source thereby producing an optically-detectable interference image including the embedded pattern of information. An image capture system is used to capture an image of the optically-detectable interference image, and a data processing system is used to analyze the captured image to detect the embedded pattern of information. One or more actions are initiated in response to the detected pattern of information.

Abstract: A process for depositing a thin film material on a substrate is disclosed, comprising simultaneously directing a series of gas flows from the output face of a delivery head of a thin film deposition system toward the surface of a substrate, and wherein the series of gas flows comprises at least a first reactive gaseous material, an inert purge gas, and a second reactive gaseous material, wherein the first reactive gaseous material is capable of reacting with a substrate surface treated with the second reactive gaseous material, wherein one or more of the gas flows provides a pressure that at least contributes to the separation of the surface of the substrate from the face of the delivery head. A system capable of carrying out such a process is also disclosed.