Abstract: A temperature control system is used for controlling a temperature of a control target to a target temperature that changes with lapse of time. The system includes: a first adjustment apparatus that includes a first tank that stores a first heat transfer medium, adjusts the temperature of the first heat transfer medium to a first set temperature, and supplies the temperature-adjusted first heat transfer medium; a first circulation circuit through which the first heat transfer medium flows from the first adjustment apparatus to a first flow-through path and returns to the first adjustment apparatus; an adjustment section that adjusts an amount of heat supplied from the first flow-through path to the control target; a memory that stores a relation between the lapse of time and the target temperature; and a controller.

Abstract: A temperature control system is used for controlling a temperature of a control target. The system includes: a first circulation circuit through which a first heat transfer medium circulates; a second circulation circuit that is independent of the first circulation circuit and through which a second heat transfer medium circulates; and a third circulation circuit that is independent of the first circulation circuit and the second circulation circuit and through which a third heat transfer medium circulates. The third heat transfer medium has a usable temperature range wider than usable temperature ranges of the first heat transfer medium and the second heat transfer medium.

Abstract: A temperature regulating apparatus includes: a heating section configured to produce a heating liquid; a cooling section configured to produce a cooling liquid; a heating-liquid delivery pipe for delivering the heating liquid to the semiconductor-device manufacturing equipment; a cooling-liquid delivery pipe for delivering the cooling liquid to the semiconductor-device manufacturing equipment; a heating-side return pipe for returning a liquid mixture of the heating liquid and the cooling liquid that have passed through the semiconductor-device manufacturing equipment to the heating section; a cooling-side return pipe for returning the liquid mixture that has passed through the semiconductor-device manufacturing equipment to the cooling section; and at least one of a heating-side heat exchanger configured to exchange heat between the heating liquid and the liquid mixture and a cooling-side heat exchanger configured to exchange heat between the cooling liquid and the liquid mixture.

Abstract: A temperature control system is used for controlling a temperature of a control target. The system includes: a first circulation circuit through which a first heat transfer medium circulates; a second circulation circuit that is independent of the first circulation circuit and through which a second heat transfer medium circulates; and a third circulation circuit that is independent of the first circulation circuit and the second circulation circuit and through which a third heat transfer medium circulates. The third heat transfer medium has a usable temperature range wider than usable temperature ranges of the first heat transfer medium and the second heat transfer medium.

Abstract: A cooling system includes: a first cooling apparatus electrically driven to supply a first heat transfer medium cooled to a first set temperature or lower; a plurality of second cooling apparatuses each of which includes a heat exchanger that exchanges heat between the first heat transfer medium supplied from the first cooling apparatus and a second heat transfer medium, and is electrically driven to supply a third heat transfer medium cooled to a second set temperature or lower, the second set temperature being changed individually with lapse of time; and a processor that obtains second set temperatures of the second cooling apparatuses and sets the first set temperature based on the obtained second set temperatures.

Abstract: A sub-fab area installation apparatus capable of reducing a power consumption used in manufacturing of semiconductors is disclosed. The sub-fab area installation apparatus includes: a vacuum pump configured to evacuate a processing gas from a processing chamber of the semiconductor manufacturing equipment; a cooling unit configured to cool a first circulation liquid used in the processing chamber; a heating unit configured to heat a second circulation liquid used in the processing chamber; an abatement device configured to detoxify the processing gas discharged from the vacuum pump; and a cooling-liquid line configured to pass a cooling liquid therethrough. The cooling liquid is supplied from a cooling source. The cooling-liquid line includes: a first downstream line, a second downstream line, and a third downstream line configured to supply the cooling liquid that has passed through the abatement device, the vacuum pump, and the cooling unit to the heating unit.

Abstract: A sub-fab area installation apparatus includes: a vacuum pump configured to evacuate a processing gas from a processing chamber of the semiconductor manufacturing equipment; a cooling unit configured to cool a first circulation liquid used in the processing chamber; a heating unit configured to heat a second circulation liquid used in the processing chamber; and a cooling-liquid line configured to pass a cooling liquid therethrough. The cooling liquid is supplied from a cooling source. The cooling-liquid line includes: a distribution line configured to supply the cooling liquid to the vacuum pump and the cooling unit; and a merging return line configured to merge the cooling liquid that has passed through the vacuum pump and the cooling unit and return the cooling liquid to the cooling source.

Abstract: A multi-refrigeration-cycle apparatus capable of reducing an installation area for equipment installed in a sub-fab and capable of shortening a pipe for delivering a cooling medium to a semiconductor-device manufacturing equipment is disclosed. The multi-refrigeration-cycle apparatus includes: a first refrigeration cycle having a first refrigerant for performing heat exchange with a cooling medium for cooling the semiconductor-device manufacturing equipment, the first refrigerant circulating in the first refrigeration cycle; and a second refrigeration cycle having a second refrigerant for performing heat exchange with the first refrigerant, the second refrigerant circulating in the second refrigeration cycle. At least a part of the first refrigeration cycle is arranged in a clean room where the semiconductor-device manufacturing equipment is installed, and the second refrigeration cycle is arranged in a sub-fab.

Abstract: A cooling system includes: a first cooling apparatus electrically driven to supply a first heat transfer medium cooled to a first set temperature or lower; a plurality of second cooling apparatuses each of which includes a heat exchanger that exchanges heat between the first heat transfer medium supplied from the first cooling apparatus and a second heat transfer medium, and is electrically driven to supply a third heat transfer medium cooled to a second set temperature or lower, the second set temperature being changed individually with lapse of time; and a processor that obtains second set temperatures of the second cooling apparatuses and sets the first set temperature based on the obtained second set temperatures.

Abstract: A temperature control system is used for controlling a temperature of a control target to a target temperature that changes with lapse of time. The system includes: a first adjustment apparatus that includes a first tank that stores a first heat transfer medium, adjusts the temperature of the first heat transfer medium to a first set temperature, and supplies the temperature-adjusted first heat transfer medium; a first circulation circuit through which the first heat transfer medium flows from the first adjustment apparatus to a first flow-through path and returns to the first adjustment apparatus; an adjustment section that adjusts an amount of heat supplied from the first flow-through path to the control target; a memory that stores a relation between the lapse of time and the target temperature; and a controller.

Abstract: A temperature control system is used for controlling a temperature of a control target. The system includes: a first circulation circuit through which a first heat transfer medium circulates; a second circulation circuit that is independent of the first circulation circuit and through which a second heat transfer medium circulates; and a third circulation circuit that is independent of the first circulation circuit and the second circulation circuit and through which a third heat transfer medium circulates. The third heat transfer medium has a usable temperature range wider than usable temperature ranges of the first heat transfer medium and the second heat transfer medium.

Abstract: A temperature control system is used for controlling a temperature of a control target. The system includes: a first circulation circuit through which a first heat transfer medium circulates; a second circulation circuit that is independent of the first circulation circuit and through which a second heat transfer medium circulates; and a third circulation circuit that is independent of the first circulation circuit and the second circulation circuit and through which a third heat transfer medium circulates. The third heat transfer medium has a usable temperature range wider than usable temperature ranges of the first heat transfer medium and the second heat transfer medium.

Abstract: The present invention provides a high-efficiency absorption refrigerating machine which can recover heat from a heat source and can efficiently recover heat from an internal cycle. The absorption refrigerating machine includes an evaporator, an absorber (A), a condenser (C), a high-temperature regenerator (GH), a low-temperature regenerator (GL), a low-temperature solution heat exchanger (LX), and solution paths and refrigerant paths by which these units are connected. The absorption refrigerating machine further comprises two branch solution paths branched from a solution supply path through which a dilute solution is introduced from the absorption (A) to the high-temperature regenerator (GH). On one of the branch solution paths, there is disposed a drain heat exchanger (DX) operable to perform heat exchange between the dilute solution in the branch solution path and an exhaust heat source which has heated the high-temperature regenerator (GH).